|
Selected(0)Clear
Items/Page: Sort: |
| Field emission properties of a-C and a-C:H films deposited on silicon surfaces modified with nickel nanoparticles 期刊论文
Chinese Physics B, 2016, 卷号: 25, 期号: 4, 页码: 048101(1-6)
Authors: Jiang JL(姜金龙); Wang YB(王玉宝); Wang Q(王琼); Huang H(黄浩); Wei ZQ(魏智强); Hao JY(郝俊英)
 Adobe PDF(1079Kb) |  Favorite | View/Download：98/1 | Submit date：2016/08/19
Dlc Films Field Emission Magnetron Sputtering Nickel Nanoparticles Modification |
| Properties of a-C:H:Si thin films deposited by middle-frequency magnetron sputtering 期刊论文
Applied Surface Science, 2016, 卷号: 379, 页码: 516-522
Authors: Jiang JL(姜金龙); Wang, Yubao; Du, Jinfang; Yang, Hua; Hao JY(郝俊英); Jiang JL(姜金龙); Hao JY(郝俊英)
Adobe PDF(1973Kb) | Favorite | View/Download：119/0 | Submit date：2016/07/11
A-c:h:Si Films Magnetron Sputtering Structure Tribological Properties |
| Comparative study on structure and properties of titanium/silicon mono- and co-doped amorphous carbon films deposited by mid-frequency magnetron sputtering 期刊论文
Surface and Interface Analysis, 2014, 卷号: 46, 期号: 3, 页码: 139-144
Authors: Jiang JL(姜金龙); Huang H(黄浩); Wang Q(王琼); Zhu WJ(朱伟军); Hao JY(郝俊英); Liu WM(刘维民); Jiang JL(姜金龙)
Adobe PDF(385Kb) | Favorite | View/Download：294/3 | Submit date：2014/12/17
A-c:h Films Co-doping Microstructure Tribological Properties |
| 甲烷流量对中频磁控溅射制备TiSi-C:H薄膜生长和性能的影响(英文) 期刊论文
稀有金属材料与工程, 2014, 卷号: 43, 期号: 10, 页码: 2305-2310
Authors: 姜金龙; 陈娣; 王琼; 黄浩; 朱维君; 郝俊英
Adobe PDF(937Kb) | Favorite | View/Download：115/0 | Submit date：2016/02/15
A-c:h Films Middle-frequency Magnetron Sputtering Mechanical Property Tribological Property A-c:H薄膜 中频磁控溅射 力学性能 摩擦性能 |
| Microstructure and property changes induced by substrate rotation in titanium/silicon dual-doped a-C:H films deposited by mid-frequency magnetron sputtering 期刊论文
Surface and Coatings Technology, 2014, 卷号: 240, 页码: 419-424
Authors: Jiang JL(姜金龙); Wang Q(王琼); Huang H(黄浩); Wang YB(王玉宝); Zhang X(张霞); Hao JY(郝俊英); Jiang JL(姜金龙)
Adobe PDF(778Kb) | Favorite | View/Download：193/3 | Submit date：2014/12/17
A-c:h Films Mf Magnetron Sputtering Substrate Rotation Microstructure And Property |
| Influence of Applied Bias Voltage on the Composition, Structure, and Properties of Ti:Si-Codoped a-C:H Films Prepared by Magnetron Sputtering 期刊论文
Journal of Nanomaterials, 2014, 页码: 937068-7
Authors: Jiang JL(姜金龙); Wang Q(王琼); Wang YB(王玉宝); Zhang X(张霞); Yang H(杨华); Hao JY(郝俊英); Jiang JL(姜金龙)
Adobe PDF(2112Kb) | Favorite | View/Download：230/2 | Submit date：2014/12/17 |
| Structure and characteristics of amorphous (Ti,Si)–C:H films deposited by reactive magnetron sputtering 期刊论文
Diamond and Related Materials, 2010, 卷号: 19, 页码: 1172-1177
Authors: 姜金龙; 郝俊英; 逄显娟; 王鹏; 刘维民
Adobe PDF(1497Kb) | Favorite | View/Download：209/1 | Submit date：2012/09/28
Amorphous Hydrogenated Carbon Doping Microstructure Superlow Friction |
| Superlow friction of titanium/silicon codoped hydrogenated amorphous carbon film in the ambient air 期刊论文
Journal of Applied Physics, 2010, 卷号: 108, 页码: 33510(1-6)
Authors: Jiang JL(姜金龙); Hao JY(郝俊英); Wang P(王鹏); Liu WM(刘维民)
Adobe PDF(1269Kb) | Favorite | View/Download：259/1 | Submit date：2012/09/28 |
