| Structure and characteristics of amorphous (Ti,Si)–C:H films deposited by reactive magnetron sputtering | |
| Department | 固体润滑国家重点实验室 |
姜金龙; 郝俊英 ; 逄显娟; 王鹏; 刘维民
| |
| 2010 | |
| Source Publication | Diamond and Related Materials
 |
| ISSN | 0925-9635 |
| Volume | 19Pages:1172-1177 |
| Keyword | Amorphous Hydrogenated Carbon Doping Microstructure Superlow Friction |
| Subject Area | 材料科学与物理化学 |
| Funding Organization | the Natural Science Foundation of China (Grant No: 50823008,50905177, 50902133);973 Project (Grant; No. 2007CB607601) of the Ministry of Science and Technology of China. |
| Indexed By | SCI |
| Language | 英语 |
| Funding Project | 空间润滑材料组 |
| Document Type | 期刊论文 |
| Identifier | http://ir.licp.cn/handle/362003/985 |
| Collection | 固体润滑国家重点实验室（LSL） |
| Corresponding Author | 刘维民 |
| Recommended Citation GB/T 7714 | 姜金龙,郝俊英,逄显娟,等. Structure and characteristics of amorphous (Ti,Si)–C:H films deposited by reactive magnetron sputtering[J]. Diamond and Related Materials,2010,19:1172-1177. |
| APA | 姜金龙,郝俊英,逄显娟,王鹏,&刘维民.(2010).Structure and characteristics of amorphous (Ti,Si)–C:H films deposited by reactive magnetron sputtering.Diamond and Related Materials,19,1172-1177. |
| MLA | 姜金龙,et al."Structure and characteristics of amorphous (Ti,Si)–C:H films deposited by reactive magnetron sputtering".Diamond and Related Materials 19(2010):1172-1177. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 20101172-1177.pdf（1497KB） | 开放获取 | License | View Application Full Text | |||
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