×
验证码:
换一张
Forgotten Password?
Stay signed in
×
Log In
Chinese
|
English
中国科学院兰州化学物理研究所机构知识库
KMS Lanzhou Institute of Chemical Physics，Chinese Academy of Sciences
Log In
Register
ALL
ORCID
Title
Creator
Subject Area
Keyword
Document Type
Source Publication
Indexed By
Publisher
Date Issued
Date Accessioned
Funding Project
MOST Discipline Catalogue
Study Hall
Image search
Paste the image URL
Home
Collections
Authors
DocType
Subjects
K-Map
News
Search in the results
Collection
固体润滑国家重点实验... [1]
Source Publication
Applied Su... [1]
Funding Project
空间润滑材料组 [1]
Funding Organization
the Nation... [1]
Creator
Du, Jinfan... [1]
Wang, Yuba... [1]
Yang, Hua [1]
姜金龙 [1]
郝俊英 [1]
Language
英语 [1]
Document Type
Journal ar... [1]
Date Issued
2016 [1]
Indexed By
SCI [1]
End Date
Corresponding Author
×
Knowledge Map
LICP OpenIR
Start a Submission
Submissions
Unclaimed
Claimed
Attach Fulltext
Bookmarks
QQ
Weibo
Feedback
Browse/Search Results:
1-1 of 1
Help
Selected(
0
)
Clear
Items/Page:
5
10
15
20
25
30
35
40
45
50
55
60
65
70
75
80
85
90
95
100
Sort:
Select
Title Ascending
Title Descending
Author Ascending
Author Descending
Submit date Ascending
Submit date Descending
Issue Date Ascending
Issue Date Descending
Journal Impact Factor Ascending
Journal Impact Factor Descending
WOS Cited Times Ascending
WOS Cited Times Descending
Properties of a-C:H:Si thin films deposited by middle-frequency magnetron sputtering
期刊论文
Applied Surface Science, 2016, 卷号: 379, 页码: 516-522
Authors:
Jiang JL(姜金龙)
;
Wang, Yubao
;
Du, Jinfang
;
Yang, Hua
;
Hao JY(郝俊英)
;
Jiang JL(姜金龙)
;
Hao JY(郝俊英)
Adobe PDF(1973Kb)
|
Favorite
|
View/Download：119/0
|
Submit date：2016/07/11
A-c:h:Si Films
Magnetron Sputtering
Structure
Tribological Properties
