Properties of a-C:H:Si thin films deposited by middle-frequency magnetron sputtering | |
Department | 固体润滑国家重点实验室 |
Jiang JL(姜金龙)1,2; Wang, Yubao1; Du, Jinfang1; Yang, Hua1; Hao JY(郝俊英)3; Jiang JL(姜金龙); Hao JY(郝俊英) | |
2016 | |
Source Publication | Applied Surface Science |
ISSN | 0169-4332 |
Volume | 379Pages:516-522 |
Abstract | The silicon doped hydrogenated amorphous carbon (a-C:H:Si) films were prepared on silicon substrates by middle-frequency magnetron sputtering silicon target in an argon and methane gas mixture atmosphere. The deposition rate, chemical composition, structure, surface properties, stress, hardness and tribological properties in the ambient air of the films were systemically investigated using X-ray photoelectron spectroscopy (XPS), scanning electron microscope (SEM), atomic force microscopy (AFM), nanoindentation and tribological tester. The results show that doped silicon content in the films is controlled in the wide range from 39.7 at.% to 0.2 at.% by various methane gas flow rate, and methane flow rate affects not only the silicon content but also its chemical bonding structure in the films due to the transformation of sputtering modes. Meanwhile, the sp3 carbon component in the films linearly increases with increasing of methane flow rate. The film deposited at moderate methane flow rate of 40–60 sccm exhibits the very smooth surface (RMS roughness 0.4 nm), low stress (0.42 GPa), high hardness (21.1 GPa), as well as low friction coefficient (0.038) and wear rate (1.6 × 10−7 mm3/Nm). The superior tribological performance of the films could be attributed to the formation and integral covering of the transfer materials on the sliding surface and their high hardness. |
Keyword | A-c:h:Si Films Magnetron Sputtering Structure Tribological Properties |
Subject Area | 材料科学与物理化学 |
DOI | 10.1016/j.apsusc.2016.04.014 |
Funding Organization | the National Natural Science Foundation of China (Grant No. 51105186) |
Indexed By | SCI |
If | 3.387 |
Language | 英语 |
Funding Project | 空间润滑材料组 |
compositor | 第三作者单位 |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.licp.cn/handle/362003/19961 |
Collection | 固体润滑国家重点实验室(LSL) |
Corresponding Author | Jiang JL(姜金龙); Hao JY(郝俊英) |
Affiliation | 1.Lanzhou Univ Technol, State Key Lab Adv Proc & Recycling Nonferrous Met, Lanzhou 730050, Peoples R China 2.Lanzhou Univ Technol, Sch Sci, Lanzhou 730050, Peoples R China 3.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China |
Recommended Citation GB/T 7714 | Jiang JL,Wang, Yubao,Du, Jinfang,et al. Properties of a-C:H:Si thin films deposited by middle-frequency magnetron sputtering[J]. Applied Surface Science,2016,379:516-522. |
APA | Jiang JL.,Wang, Yubao.,Du, Jinfang.,Yang, Hua.,Hao JY.,...&郝俊英.(2016).Properties of a-C:H:Si thin films deposited by middle-frequency magnetron sputtering.Applied Surface Science,379,516-522. |
MLA | Jiang JL,et al."Properties of a-C:H:Si thin films deposited by middle-frequency magnetron sputtering".Applied Surface Science 379(2016):516-522. |
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