| 甲烷流量对中频磁控溅射制备TiSi-C:H薄膜生长和性能的影响(英文) | |
| Department | 固体润滑国家重点实验室 |
姜金龙1,2; 陈娣1; 王琼1; 黄浩1; 朱维君1; 郝俊英2
| |
| 2014 | |
| Source Publication | 稀有金属材料与工程
 |
| ISSN | 1002-185X |
| Volume | 43Issue:10Pages:2305-2310 |
| Keyword | A-c:h Films Middle-frequency Magnetron Sputtering Mechanical Property Tribological Property A-c:H薄膜 中频磁控溅射 力学性能 摩擦性能 |
| Subject Area | 材料科学与物理化学 |
| Funding Organization | National Natural Science Foundation of China(51105186);Natural Science Foundation of Gansu Province(1014RJZA007);Excellent Young Teachers Program of Lanzhou University of Technology(1010ZCX010);the Doctoral Research Grant of Lanzhou University of Technology |
| Indexed By | SCI&CSCD |
| If | 0.194(SCI-JCR);0.5287(CSCD-JCR) |
| Language | 英语 |
| Funding Project | 空间润滑材料组 |
| compositor | 第二作者单位 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.licp.cn/handle/362003/19278 |
| Collection | 固体润滑国家重点实验室（LSL） |
| Corresponding Author | 姜金龙 |
| Affiliation | 1.Lanzhou Univ Technol, Lanzhou 730050, Peoples R China 2.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China |
| Recommended Citation GB/T 7714 | 姜金龙,陈娣,王琼,等. 甲烷流量对中频磁控溅射制备TiSi-C:H薄膜生长和性能的影响(英文)[J]. 稀有金属材料与工程,2014,43(10):2305-2310. |
| APA | 姜金龙,陈娣,王琼,黄浩,朱维君,&郝俊英.(2014).甲烷流量对中频磁控溅射制备TiSi-C:H薄膜生长和性能的影响(英文).稀有金属材料与工程,43(10),2305-2310. |
| MLA | 姜金龙,et al."甲烷流量对中频磁控溅射制备TiSi-C:H薄膜生长和性能的影响(英文)".稀有金属材料与工程 43.10(2014):2305-2310. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 甲烷流量对中频磁控溅射制备TiS_省略_（937KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text | |
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