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Properties of a-C:H:Si thin films deposited by middle-frequency magnetron sputtering 期刊论文
Applied Surface Science, 2016, 卷号: 379, 页码: 516-522
Authors:  Jiang JL(姜金龙);  Wang, Yubao;  Du, Jinfang;  Yang, Hua;  Hao JY(郝俊英);  Jiang JL(姜金龙);  Hao JY(郝俊英)
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A-c:h:Si Films  Magnetron Sputtering  Structure  Tribological Properties  
Substrate Temperature Effect on the Microstructure and Properties of (Si, Al)/a-C: H Films Prepared through Magnetron Sputtering Deposition 期刊论文
Journal of Nanomaterials, 2015, 页码: 194308(1-9)
Authors:  Liu XQ(刘小强);  Hao JY(郝俊英);  Yang, Hu;  Lin, Xiuzhou;  Zeng, Xianguang
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甲烷流量对中频磁控溅射制备TiSi-C:H薄膜生长和性能的影响(英文) 期刊论文
稀有金属材料与工程, 2014, 卷号: 43, 期号: 10, 页码: 2305-2310
Authors:  姜金龙;  陈娣;  王琼;  黄浩;  朱维君;  郝俊英
Adobe PDF(937Kb)  |  Favorite  |  View/Download：117/0  |  Submit date：2016/02/15
A-c:h Films  Middle-frequency Magnetron Sputtering  Mechanical Property  Tribological Property  A-c:H薄膜  中频磁控溅射  力学性能  摩擦性能  
Influence of Applied Bias Voltage on the Composition, Structure, and Properties of Ti:Si-Codoped a-C:H Films Prepared by Magnetron Sputtering 期刊论文
Journal of Nanomaterials, 2014, 页码: 937068-7
Authors:  Jiang JL(姜金龙);  Wang Q(王琼);  Wang YB(王玉宝);  Zhang X(张霞);  Yang H(杨华);  Hao JY(郝俊英);  Jiang JL(姜金龙)
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Preparation of superior lubricious amorphous carbon films co-doped by silicon and aluminum 期刊论文
Journal of Applied Physics, 2011, 卷号: 110, 页码: 53507(1-8)
Authors:  Liu XQ(刘小强);  Hao JY(郝俊英);  Yang J(杨军);  Zheng JY(郑建云);  Liang YM(梁永民);  Liu WM(刘维民);  Hao JY(郝俊英)
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等离子体增强化学气相沉积法制备非晶氮化碳薄膜及其性能研究 学位论文
: 中国科学院研究生院, 2006
Authors:  郝俊英
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A-cnxh 薄膜  Pecvd  硬度  弹性模量  耐热耐蚀性  摩擦磨损行为  A-cnxh Films  Hardness And Elastic Modulus  Thermal Stability And Corrosion-resistant Properties  Friction And Wear Behavior