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| Effects of Al incorporation on the mechanical and tribological properties of Ti-doped a-C:H films deposited by magnetron sputtering 期刊论文
Current Applied Physics, 2011, 卷号: 11, 页码: 771-775
Authors: Pang XJ(逄显娟); Shi L(石雷) ; Wang P(王鹏); Xia YQ(夏延秋); Liu WM(刘维民)
 Adobe PDF(912Kb) |  Favorite | View/Download：339/5 | Submit date：2012/09/24
Magnetron Sputtering Tial-doped A-c:h FIlms Ti-doped A-c:h FIlms Microstructure Tribological Properties |
| Structure and characteristics of amorphous (Ti,Si)–C:H films deposited by reactive magnetron sputtering 期刊论文
Diamond and Related Materials, 2010, 卷号: 19, 页码: 1172-1177
Authors: 姜金龙; 郝俊英; 逄显娟; 王鹏; 刘维民
Adobe PDF(1497Kb) | Favorite | View/Download：212/1 | Submit date：2012/09/28
Amorphous Hydrogenated Carbon Doping Microstructure Superlow Friction |
| Superlow friction of titanium/silicon codoped hydrogenated amorphous carbon film in the ambient air 期刊论文
Journal of Applied Physics, 2010, 卷号: 108, 页码: 33510(1-6)
Authors: Jiang JL(姜金龙); Hao JY(郝俊英); Wang P(王鹏); Liu WM(刘维民)
Adobe PDF(1269Kb) | Favorite | View/Download：261/1 | Submit date：2012/09/28 |
| Formation of hydrogenated amorphous carbon films containing fullerene-like structures 期刊论文
Journal of Non-Crystalline Solids, 2009, 卷号: 355, 页码: 1742-1746
Authors: Wang P(王鹏); Wang X(王霞); Zhang B(张斌); Liu WM(刘维民)
Adobe PDF(402Kb) | Favorite | View/Download：268/7 | Submit date：2012/11/13
Films And Coatings Sputtering Carbon |
| Growth and structure of hydrogenated carbon films containing fullerene-like structure 期刊论文
Journal of Physics D:Applied Physics, 2008, 卷号: 41, 页码: 85401(1-7)
Authors: Wang P(王鹏); Wang X(王霞); Liu WM(刘维民); Zhang JY(张俊彦)
Adobe PDF(1659Kb) | Favorite | View/Download：448/20 | Submit date：2013/03/28 |
| The effect of applied negative bias voltage on the structure of Ti-doped a-C:H films deposited by FCVA 期刊论文
Applied Surface Science, 2007, 卷号: 253, 页码: 3722-3726
Authors: Wang P(王鹏); Wang X(王霞); Chen YM(陈友明); Zhang GA(张广安); Liu WM(刘维民); Zhang JY(张俊彦)
Adobe PDF(688Kb) | Favorite | View/Download：152/3 | Submit date：2013/11/01
Hydrogenated Amorphous Carbon (A-c:h) Films Applied Bias Voltage Filtered Cathodic Vacuum Arc (Fcva) |
