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Field emission properties of a-C and a-C:H films deposited on silicon surfaces modified with nickel nanoparticles 期刊论文
Chinese Physics B, 2016, 卷号: 25, 期号: 4, 页码: 048101(1-6)
Authors:  Jiang JL(姜金龙);  Wang YB(王玉宝);  Wang Q(王琼);  Huang H(黄浩);  Wei ZQ(魏智强);  Hao JY(郝俊英)
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Dlc Films  Field Emission  Magnetron Sputtering  Nickel Nanoparticles Modification  
Properties of a-C:H:Si thin films deposited by middle-frequency magnetron sputtering 期刊论文
Applied Surface Science, 2016, 卷号: 379, 页码: 516-522
Authors:  Jiang JL(姜金龙);  Wang, Yubao;  Du, Jinfang;  Yang, Hua;  Hao JY(郝俊英);  Jiang JL(姜金龙);  Hao JY(郝俊英)
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A-c:h:Si Films  Magnetron Sputtering  Structure  Tribological Properties  
甲烷流量对中频磁控溅射制备TiSi-C:H薄膜生长和性能的影响(英文) 期刊论文
稀有金属材料与工程, 2014, 卷号: 43, 期号: 10, 页码: 2305-2310
Authors:  姜金龙;  陈娣;  王琼;  黄浩;  朱维君;  郝俊英
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A-c:h Films  Middle-frequency Magnetron Sputtering  Mechanical Property  Tribological Property  A-c:H薄膜  中频磁控溅射  力学性能  摩擦性能  
Influence of Applied Bias Voltage on the Composition, Structure, and Properties of Ti:Si-Codoped a-C:H Films Prepared by Magnetron Sputtering 期刊论文
Journal of Nanomaterials, 2014, 页码: 937068-7
Authors:  Jiang JL(姜金龙);  Wang Q(王琼);  Wang YB(王玉宝);  Zhang X(张霞);  Yang H(杨华);  Hao JY(郝俊英);  Jiang JL(姜金龙)
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沉积温度对钛硅共掺杂类金刚石薄膜生长、结构和力学性能的影响 期刊论文
物理学报, 2014, 卷号: 63, 期号: 2, 页码: 028104(1-7)
Authors:  姜金龙;  黄浩;  王琼;  王善民;  魏智强;  杨华;  郝俊英
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类金刚石薄膜  共掺杂  沉积温度  结构与性能  Diamond-like Carbon Film  Deposition Temperature  Co-doping  Structure And Properties  
Preparation of superior lubricious amorphous carbon films co-doped by silicon and aluminum 期刊论文
Journal of Applied Physics, 2011, 卷号: 110, 页码: 53507(1-8)
Authors:  Liu XQ(刘小强);  Hao JY(郝俊英);  Yang J(杨军);  Zheng JY(郑建云);  Liang YM(梁永民);  Liu WM(刘维民);  Hao JY(郝俊英)
Adobe PDF(1770Kb)  |  Favorite  |  View/Download：477/1  |  Submit date：2013/06/29