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The role of trace Ti concentration on the evolution of microstructure and properties of duplex doped Ti(Ag)/DLC films 期刊论文
Vacuum, 2015, 卷号: 115, 页码: 23-30
Authors:  Ji L(吉利);  Wu YX(吴艳霞);  Li HX(李红轩);  Song H(宋惠);  Liu XH(刘晓红);  Ye YP(冶银平);  Chen JM(陈建敏);  Zhou HD(周惠娣);  Liu, Liu;  Ji L(吉利);  Li HX(李红轩)
Adobe PDF(2137Kb)  |  Favorite  |  View/Download：189/0  |  Submit date：2015/10/28
Ti(Ag)/a-c:h Film  Microstructure  Mechanical Properties  Tribological Properties  
Structure, Mechanical, and Tribological Properties of MoS2/a-C:H Composite Films 期刊论文
Tribology letters, 2013, 卷号: 52, 期号: 3, 页码: 371-380
Authors:  Wu YX(吴艳霞);  Li HX(李红轩);  Ji L(吉利);  Liu L(刘流);  Ye YP(冶银平);  Chen JM(陈建敏);  Zhou HD(周惠娣);  Chen JM(陈建敏);  Li HX(李红轩)
Adobe PDF(935Kb)  |  Favorite  |  View/Download：489/7  |  Submit date：2013/12/05
Mos2/a-c:h Film  Ar/ch4 Ratio  Tribological Properties  
Effect of vacuum annealing on the microstructure and tribological behavior of hydrogenated amorphous carbon films prepared by magnetron sputtering 期刊论文
Proceedings of the Institution of Mechanical Engineers, Part J: Journal of Engineering Tribology, 2013, 卷号: 227, 期号: 7, 页码: 729-737
Authors:  Wu YX(吴艳霞);  Li HX(李红轩);  Ji L(吉利);  Liu L(刘流);  Ye YP(冶银平);  Chen JM(陈建敏);  Zhou HD(周惠娣);  Ye YP(冶银平)
Adobe PDF(817Kb)  |  Favorite  |  View/Download：420/3  |  Submit date：2013/12/05
Magnetron Sputtering  A-c:h Film  Vacuum Annealing  Microstructure  Tribological Behavior  
Effect of Ti Incorporation on the Microstructure and Properties of the a-C:H Films Deposited by Magnetron Sputtering Technique 期刊论文
Rare Metal Materials and Engineering, 2012, 卷号: 41, 期号: 增刊:1, 页码: 366-370
Authors:  Wang YX(王永霞);  Ye YP(冶银平);  Li HX(李红轩);  Ji L(吉利);  Wang YJ(王永军);  Wu YX(吴艳霞);  Liu XH(刘晓红);  Chen JM(陈建敏);  Zhou HD(周惠娣);  Ye YP(冶银平)
Adobe PDF(596Kb)  |  Favorite  |  View/Download：286/1  |  Submit date：2013/07/12
(Ti)/a-c:h Film  Magnetron Sputtering  Annealing  Microstructure  Tribological Properties  
Microstructure and tribological properties of the a-C:H films deposited by magnetron sputtering with CH4 /Ar mixture 期刊论文
Surface and Coatings Technology, 2011, 卷号: 205, 页码: 4577-4581
Authors:  Wang YX(王永霞);  Ye YP(冶银平);  Li HX(李红轩);  Ji L(吉利);  Wang YJ(王永军);  Liu XJ(刘晓军);  Chen JM(陈建敏);  Zhou HD(周惠娣)
Adobe PDF(770Kb)  |  Favorite  |  View/Download：567/3  |  Submit date：2012/09/24
A-c:h FIlm  Magnetron Sputtering  Microstructure  Tribological Property