| Effect of Ti Incorporation on the Microstructure and Properties of the a-C:H Films Deposited by Magnetron Sputtering Technique | |
| Department | 先进润滑与防护材料研究发展中心 |
Wang YX(王永霞)1,2; Ye YP(冶银平)1 ; Li HX(李红轩)1; Ji L(吉利)1; Wang YJ(王永军)1,2; Wu YX(吴艳霞)1,2; Liu XH(刘晓红)1; Chen JM(陈建敏)1; Zhou HD(周惠娣)1; Ye YP(冶银平)
| |
| The second department | 固体润滑国家重点实验室 |
| 2012 | |
| Source Publication | Rare Metal Materials and Engineering
 |
| ISSN | 1002-185X |
| Volume | 41Issue:增刊:1Pages:366-370 |
| Abstract | Amorphous hydrogenated carbon (a-C:H) and Ti-incorporated a-C:H (Ti/a-C:H) films were deposited by magnetron sputtering with a mixture gas of CH4 and Ar. The effect of the Ti incorporation on the chemical composition, microstructure and properties of the as-deposited and the annealed films were investigated by various techniques. It has been shown that the bonding structure and the internal stress were sensitive to the incorporation of the Ti atoms. The results of the XPS revealed that the concentration of Ti atom on the surface of the film increased when the Ti/a-C:H film annealed at 300 ℃. The tribologcial properties of the (Ti/)a-C:H films changed greatly after annealed, due to the graphitization, oxidation of carbon, and so forth. It compared and discussed in detail the change of the microstructure and properties of the a-C:H and Ti/a-C:H films before and after annealed. |
| Keyword | (Ti)/a-c:h Film Magnetron Sputtering Annealing Microstructure Tribological Properties |
| Subject Area | 材料科学与物理化学 |
| Funding Organization | National Natural Science Foundation of China (50705093;50421502) |
| Indexed By | SCI |
| If | 0.160 |
| Language | 英语 |
| Funding Project | 磨损和表面工程组 |
| compositor | 第一作者单位 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.licp.cn/handle/362003/3442 |
| Collection | 固体润滑国家重点实验室（LSL） 中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心 |
| Corresponding Author | Ye YP(冶银平) |
| Affiliation | 1.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China 2.Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China |
| Recommended Citation GB/T 7714 | Wang YX,Ye YP,Li HX,et al. Effect of Ti Incorporation on the Microstructure and Properties of the a-C:H Films Deposited by Magnetron Sputtering Technique[J]. Rare Metal Materials and Engineering,2012,41(增刊:1):366-370. |
| APA | Wang YX.,Ye YP.,Li HX.,Ji L.,Wang YJ.,...&冶银平.(2012).Effect of Ti Incorporation on the Microstructure and Properties of the a-C:H Films Deposited by Magnetron Sputtering Technique.Rare Metal Materials and Engineering,41(增刊:1),366-370. |
| MLA | Wang YX,et al."Effect of Ti Incorporation on the Microstructure and Properties of the a-C:H Films Deposited by Magnetron Sputtering Technique".Rare Metal Materials and Engineering 41.增刊:1(2012):366-370. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 366-370.PDF（596KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text | |
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment