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Microstructure and tribological properties of the a-C:H films deposited by magnetron sputtering with CH4 /Ar mixture 期刊论文
Surface and Coatings Technology, 2011, 卷号: 205, 页码: 4577-4581
Authors:  Wang YX(王永霞);  Ye YP(冶银平);  Li HX(李红轩);  Ji L(吉利);  Wang YJ(王永军);  Liu XJ(刘晓军);  Chen JM(陈建敏);  Zhou HD(周惠娣)
Adobe PDF(770Kb)  |  Favorite  |  View/Download：566/3  |  Submit date：2012/09/24
A-c:h FIlm  Magnetron Sputtering  Microstructure  Tribological Property