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Effect of microstructural evolution on mechanical and tribological properties of Ti-doped DLC films: How was an ultralow friction obtained? 期刊论文
Journal of Vacuum Science and Technology A, 2016, 卷号: 34, 期号: 3, 页码: 031504(1-10)
Authors:  Zhao F(赵飞);  Li HX(李红轩);  Ji L(吉利);  Wang YJ(王永军);  Liu XH(刘晓红);  Zhou HD(周惠娣);  Chen JM(陈建敏);  Chen JM(陈建敏)
Adobe PDF(3999Kb)  |  Favorite  |  View/Download：180/6  |  Submit date：2016/09/05
Microstructure, Morphology and Properties of Titanium Containing Graphite-Like Carbon Films Deposited by Unbalanced Magnetron Sputtering 期刊论文
Tribology letters, 2013, 卷号: 49, 期号: 1, 页码: 47-59
Authors:  Chen JM(陈建敏);  Wang YJ(王永军);  Li HX(李红轩);  Ji L(吉利);  Wu YX(吴艳霞);  Lv YH(吕艳红);  Liu XH(刘晓红);  Fu YY(付英英);  Zhou HD(周惠娣);  Chen JM(陈建敏);  Wang YJ(王永军)
Adobe PDF(1296Kb)  |  Favorite  |  View/Download：740/3  |  Submit date：2013/12/09
Magnetron Sputtering  Graphite-like Carbon  Titanium Carbides  Microstructure  Properties  
Synthesis and characterization of titanium-containing graphite-like carbon films with low internal stress and superior tribological properties 期刊论文
Journal of physics D: Applied physics, 2012, 卷号: 45, 期号: 29, 页码: 295301(1-10)
Authors:  Wang YJ(王永军);  Li HX(李红轩);  Ji L(吉利);  Liu XH(刘晓红);  Wu YX(吴艳霞);  Lv YH(吕艳红);  Fu YY(付英英);  Zhou HD(周惠娣);  Chen JM(陈建敏);  Chen JM(陈建敏)
Adobe PDF(1476Kb)  |  Favorite  |  View/Download：330/1  |  Submit date：2013/07/12
Effect of Ti Incorporation on the Microstructure and Properties of the a-C:H Films Deposited by Magnetron Sputtering Technique 期刊论文
Rare Metal Materials and Engineering, 2012, 卷号: 41, 期号: 增刊:1, 页码: 366-370
Authors:  Wang YX(王永霞);  Ye YP(冶银平);  Li HX(李红轩);  Ji L(吉利);  Wang YJ(王永军);  Wu YX(吴艳霞);  Liu XH(刘晓红);  Chen JM(陈建敏);  Zhou HD(周惠娣);  Ye YP(冶银平)
Adobe PDF(596Kb)  |  Favorite  |  View/Download：286/1  |  Submit date：2013/07/12
(Ti)/a-c:h Film  Magnetron Sputtering  Annealing  Microstructure  Tribological Properties  
Influence of substrate bias voltage on the microstructure and residual stress of CrN films deposited by medium frequency magnetron sputtering 期刊论文
Materials Science and Engineering B, 2011, 卷号: 176, 页码: 850-854
Authors:  Gong QH(巩清华);  Ji L(吉利);  Li HX(李红轩);  Liu XH(刘晓红);  Wang YJ(王永军);  Chen JM(陈建敏);  Zhou HD(周惠娣)
Adobe PDF(519Kb)  |  Favorite  |  View/Download：292/3  |  Submit date：2012/09/24
Crn FIlms  Medium Frequency Magnetron Sputterin  Substrate Bias Voltage  Microstructure  Residual Stress