| Influence of substrate bias voltage on the microstructure and residual stress of CrN films deposited by medium frequency magnetron sputtering | |
| Department | 固体润滑国家重点实验室 ; 先进润滑与防护材料研究发展中心 |
Gong QH(巩清华); Ji L(吉利) ; Li HX(李红轩); Liu XH(刘晓红); Wang YJ(王永军); Chen JM(陈建敏); Zhou HD(周惠娣)
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| 2011 | |
| Source Publication | Materials Science and Engineering B
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| ISSN | 0921-5107 |
| Volume | 176Pages:850-854 |
| Abstract | In this study, CrN films were deposited on stainless steel and Si (1 1 1) substrates via medium frequency magnetron sputtering under a systematic variation of the substrate bias voltage. The influence of the substrate bias voltage on the structural and the mechanical properties of the films were investigated. It is observed that there are two clear regions(1) below −300V, and (2) above −300V. For the former region, the (1 1 1) texture is dominated as the substrate bias voltage is increased to −200V. The lattice parameter is smaller than that of CrN reported in the ICSD standard (4.140 ˚ A) and the as-deposited films exhibit tensile stress. Meanwhile, the surface roughness decreases and the N concentration show a slow increase. For the latter region, the (2 0 0)-oriented structure is formed. However, the lattice parameter is larger as compared with the value reported in the ICSD standard, and the surface roughness increases and the N concentration decreases obviously. In this case, the compressive stress is obtained. |
| Keyword | Crn FIlms Medium Frequency Magnetron Sputterin Substrate Bias Voltage Microstructure Residual Stress |
| Subject Area | 材料科学与物理化学 |
| Funding Organization | the National Natural Science Foundation of China (Grant NO.50705093);the Innovative Group Foundation from NSFC (Grant NO.50421502) |
| Indexed By | SCI |
| Language | 英语 |
| Funding Project | 磨损和表面工程组 |
| Document Type | 期刊论文 |
| Identifier | http://ir.licp.cn/handle/362003/788 |
| Collection | 固体润滑国家重点实验室（LSL） 中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心 |
| Corresponding Author | Li HX(李红轩) |
| Recommended Citation GB/T 7714 | Gong QH,Ji L,Li HX,et al. Influence of substrate bias voltage on the microstructure and residual stress of CrN films deposited by medium frequency magnetron sputtering[J]. Materials Science and Engineering B,2011,176:850-854. |
| APA | 巩清华.,吉利.,李红轩.,刘晓红.,王永军.,...&周惠娣.(2011).Influence of substrate bias voltage on the microstructure and residual stress of CrN films deposited by medium frequency magnetron sputtering.Materials Science and Engineering B,176,850-854. |
| MLA | 巩清华,et al."Influence of substrate bias voltage on the microstructure and residual stress of CrN films deposited by medium frequency magnetron sputtering".Materials Science and Engineering B 176(2011):850-854. |
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| 2011850-854.PDF（519KB） | 开放获取 | License | View Application Full Text | |||
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