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Influence of substrate bias voltage on the microstructure and residual stress of CrN films deposited by medium frequency magnetron sputtering 期刊论文
Materials Science and Engineering B, 2011, 卷号: 176, 页码: 850-854
Authors:  Gong QH(巩清华);  Ji L(吉利);  Li HX(李红轩);  Liu XH(刘晓红);  Wang YJ(王永军);  Chen JM(陈建敏);  Zhou HD(周惠娣)
Adobe PDF(519Kb)  |  Favorite  |  View/Download：291/3  |  Submit date：2012/09/24
Crn FIlms  Medium Frequency Magnetron Sputterin  Substrate Bias Voltage  Microstructure  Residual Stress