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Nanostructured TiN-based thin films by a novel and facile synthetic route 期刊论文
Materials and Design, 2017, 卷号: 113, 页码: 142-148
Authors:  Zheng JY(郑建云);  Lv, Yanhong;  Xu SS(徐书生);  Han, Xi;  Zhang, Shuaituo;  Hao JY(郝俊英);  Liu WM(刘维民);  Zheng JY(郑建云);  Hao JY(郝俊英)
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Nanostructured Thin Films  Tin-based  High Specific Area  Transparent And Hydrophobic  Flexible And Superhard  
Silicon and aluminum doping effects on the microstructure and properties of polymeric amorphous carbon films 期刊论文
Applied Surface Science, 2016, 卷号: 379, 页码: 358-366
Authors:  Liu XQ(刘小强);  Hao JY(郝俊英);  Xie, Yuntao;  Liu XQ(刘小强);  Hao JY(郝俊英)
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Polymeric Amorphous Carbon  Nanostructure  Mechanical Properties  Super-low Friction  Wear Resistance  
Substrate Temperature Effect on the Microstructure and Properties of (Si, Al)/a-C: H Films Prepared through Magnetron Sputtering Deposition 期刊论文
Journal of Nanomaterials, 2015, 页码: 194308(1-9)
Authors:  Liu XQ(刘小强);  Hao JY(郝俊英);  Yang, Hu;  Lin, Xiuzhou;  Zeng, Xianguang
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甲烷流量对中频磁控溅射制备TiSi-C:H薄膜生长和性能的影响(英文) 期刊论文
稀有金属材料与工程, 2014, 卷号: 43, 期号: 10, 页码: 2305-2310
Authors:  姜金龙;  陈娣;  王琼;  黄浩;  朱维君;  郝俊英
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A-c:h Films  Middle-frequency Magnetron Sputtering  Mechanical Property  Tribological Property  A-c:H薄膜  中频磁控溅射  力学性能  摩擦性能  
Influence of Applied Bias Voltage on the Composition, Structure, and Properties of Ti:Si-Codoped a-C:H Films Prepared by Magnetron Sputtering 期刊论文
Journal of Nanomaterials, 2014, 页码: 937068-7
Authors:  Jiang JL(姜金龙);  Wang Q(王琼);  Wang YB(王玉宝);  Zhang X(张霞);  Yang H(杨华);  Hao JY(郝俊英);  Jiang JL(姜金龙)
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Properties of TiN/TiCN multilayer films by direct current magnetron sputtering 期刊论文
Journal of Physics D: Applied Physics, 2012, 卷号: 45, 期号: 9, 页码: 095303(1-9)
Authors:  Zheng JY(郑建云);  Hao JY(郝俊英);  Liu XQ(刘小强);  Liu WM(刘维民);  Hao JY(郝俊英)
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The effect of applied negative bias voltage on the structure of Ti-doped a-C:H films deposited by FCVA 期刊论文
Applied Surface Science, 2007, 卷号: 253, 页码: 3722-3726
Authors:  Wang P(王鹏);  Wang X(王霞);  Chen YM(陈友明);  Zhang GA(张广安);  Liu WM(刘维民);  Zhang JY(张俊彦)
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Hydrogenated Amorphous Carbon (A-c:h) Films  Applied Bias Voltage  Filtered Cathodic Vacuum Arc (Fcva)