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中国科学院兰州化学物理研究所机构知识库
KMS Lanzhou Institute of Chemical Physics,Chinese Academy of Sciences
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固体润滑国家重点实验... [6]
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Applied Su... [2]
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空间润滑材料组 [6]
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郝俊英 [6]
姜金龙 [3]
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Indexed By:SCI
Creator:郝俊英
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Funding Project:空间润滑材料组
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Silicon and aluminum doping effects on the microstructure and properties of polymeric amorphous carbon films
期刊论文
Applied Surface Science, 2016, 卷号: 379, 页码: 358-366
Authors:
Liu XQ(刘小强)
;
Hao JY(郝俊英)
;
Xie, Yuntao
;
Liu XQ(刘小强)
;
Hao JY(郝俊英)
Adobe PDF(2466Kb)
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View/Download:94/2
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Submit date:2016/07/13
Polymeric Amorphous Carbon
Nanostructure
Mechanical Properties
Super-low Friction
Wear Resistance
Properties of a-C:H:Si thin films deposited by middle-frequency magnetron sputtering
期刊论文
Applied Surface Science, 2016, 卷号: 379, 页码: 516-522
Authors:
Jiang JL(姜金龙)
;
Wang, Yubao
;
Du, Jinfang
;
Yang, Hua
;
Hao JY(郝俊英)
;
Jiang JL(姜金龙)
;
Hao JY(郝俊英)
Adobe PDF(1973Kb)
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View/Download:122/0
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Submit date:2016/07/11
A-c:h:Si Films
Magnetron Sputtering
Structure
Tribological Properties
Microstructure and property changes induced by substrate rotation in titanium/silicon dual-doped a-C:H films deposited by mid-frequency magnetron sputtering
期刊论文
Surface and Coatings Technology, 2014, 卷号: 240, 页码: 419-424
Authors:
Jiang JL(姜金龙)
;
Wang Q(王琼)
;
Huang H(黄浩)
;
Wang YB(王玉宝)
;
Zhang X(张霞)
;
Hao JY(郝俊英)
;
Jiang JL(姜金龙)
Adobe PDF(778Kb)
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Submit date:2014/12/17
A-c:h Films
Mf Magnetron Sputtering
Substrate Rotation
Microstructure And Property
Influence of Applied Bias Voltage on the Composition, Structure, and Properties of Ti:Si-Codoped a-C:H Films Prepared by Magnetron Sputtering
期刊论文
Journal of Nanomaterials, 2014, 页码: 937068-7
Authors:
Jiang JL(姜金龙)
;
Wang Q(王琼)
;
Wang YB(王玉宝)
;
Zhang X(张霞)
;
Yang H(杨华)
;
Hao JY(郝俊英)
;
Jiang JL(姜金龙)
Adobe PDF(2112Kb)
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Submit date:2014/12/17
Effect of deposition pressure on the adhesion and tribological properties of a-CNxH films prepared by DC-RF-PECVD
期刊论文
Journal of Materials Science, 2008, 卷号: 43, 页码: 645-651
Authors:
Ding J(丁军)
;
Hao JY(郝俊英)
;
Xue QJ(薛群基)
;
Liu WM(刘维民)
Adobe PDF(518Kb)
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View/Download:240/0
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Submit date:2013/03/28
Effect of N2/CH4 flow ratio on microstructure and composition of hydrogenated carbon nitride films prepared by a dual DC-RF plasma system
期刊论文
Journal of Non-Crystalline Solids, 2007, 卷号: 353, 页码: 136-142
Authors:
Hao JY(郝俊英)
;
Liu WM(刘维民)
;
Xue QJ(薛群基)
Adobe PDF(201Kb)
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View/Download:272/2
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Submit date:2013/11/01
Films And Coatings
Chemical Vapor Deposition
Plasma Deposition
Vapor Phase Deposition
Hardness
Indentation
Microindentation
Microstructure
Ftir Measurements
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