| Effect of N2/CH4 flow ratio on microstructure and composition of hydrogenated carbon nitride films prepared by a dual DC-RF plasma system | |
| Department | 固体润滑国家重点实验室 |
Hao JY(郝俊英) ; Liu WM(刘维民); Xue QJ(薛群基)
| |
| 2007 | |
| Source Publication | Journal of Non-Crystalline Solids
 |
| ISSN | 0022-3093 |
| Volume | 353Pages:136-142 |
| Abstract | Hydrogenated carbon nitride (a-CN:H) films were deposited on n-type (100) silicon substrates making use of direct current radio frequency plasma enhanced chemical vapor deposition (DC-RF-PECVD), using a gas mixture of CH4 and N2 as the source gas in range of N2/CH4 flow ratio from 1/3 to 3/1 (sccm). The deposition rate, composition and bonding structure of the a-CN:H films were characterized by means of X-ray photoelectron spectroscopy (XPS) and Fourier-transform infrared spectrometry (FTIR). The mechanical properties of the deposited films were evaluated using nano-indentation test. It was found that the parameter for the DC-RF-PECVD process had significant effects on the growth rate, structure and properties of the deposited films. The deposition rate of the films decreased clearly, while the N/C ratio in the films increased with increasing N2/CH4 flow ratio. CN radicals were remarkably formed in the deposited films at different N2/CH4 flow ratio, and their contents are related to the nitrogen concentrations in the deposited films. Moreover, the hardness and Young’s modulus of the a-CN:H films sharply increased at first with increasing N2/CH4 flow ratio, then dramatically decreased with further increase of the N2/CH4 flow ratio, and the a-CN:H film deposited at 1/1 had the maximum hardness and Young’s modulus. In addition, the structural transformation from sp3-like to sp2-like carbon–nitrogen network in the deposited films also was revealed. |
| Keyword | Films And Coatings Chemical Vapor Deposition Plasma Deposition Vapor Phase Deposition Hardness Indentation Microindentation Microstructure Ftir Measurements Xps |
| Subject Area | 材料科学与物理化学 |
| Funding Organization | the National Natural Science Foundation of China (Grant Nos. 50405040;50432020);‘973’ program of China (Grant No. 2007CB607601);the Innovative Group Foundation from NSFC (Grant No. 50421502) |
| Indexed By | SCI |
| Language | 英语 |
| Funding Project | 空间润滑材料组 ; 低维材料摩擦学组 |
| Document Type | 期刊论文 |
| Identifier | http://ir.licp.cn/handle/362003/4046 |
| Collection | 固体润滑国家重点实验室（LSL） |
| Corresponding Author | Hao JY(郝俊英) |
| Recommended Citation GB/T 7714 | Hao JY,Liu WM,Xue QJ. Effect of N2/CH4 flow ratio on microstructure and composition of hydrogenated carbon nitride films prepared by a dual DC-RF plasma system[J]. Journal of Non-Crystalline Solids,2007,353:136-142. |
| APA | 郝俊英,刘维民,&薛群基.(2007).Effect of N2/CH4 flow ratio on microstructure and composition of hydrogenated carbon nitride films prepared by a dual DC-RF plasma system.Journal of Non-Crystalline Solids,353,136-142. |
| MLA | 郝俊英,et al."Effect of N2/CH4 flow ratio on microstructure and composition of hydrogenated carbon nitride films prepared by a dual DC-RF plasma system".Journal of Non-Crystalline Solids 353(2007):136-142. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2007136-142.pdf（201KB） | 开放获取 | CC BY-NC-SA | View Application Full Text | |||
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment