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Properties of a-C:H:Si thin films deposited by middle-frequency magnetron sputtering 期刊论文
Applied Surface Science, 2016, 卷号: 379, 页码: 516-522
Authors:  Jiang JL(姜金龙);  Wang, Yubao;  Du, Jinfang;  Yang, Hua;  Hao JY(郝俊英);  Jiang JL(姜金龙);  Hao JY(郝俊英)
Adobe PDF(1973Kb)  |  Favorite  |  View/Download：120/0  |  Submit date：2016/07/11
A-c:h:Si Films  Magnetron Sputtering  Structure  Tribological Properties  
Electrochemical corrosion behaviors of a-C:H and a-C:NX:H films 期刊论文
Applied Surface Science, 2008, 卷号: 254, 页码: 3021-3025
Authors:  Wang Z(王舟);  Wang CB(王成兵);  Wang Q(王琦);  Zhang JY(张俊彦)
Adobe PDF(482Kb)  |  Favorite  |  View/Download：157/2  |  Submit date：2013/03/28
Electrochemical Corrosion  Cvd  A-c:h FIlms  A-c:Nx:h FIlms  
The effect of applied negative bias voltage on the structure of Ti-doped a-C:H films deposited by FCVA 期刊论文
Applied Surface Science, 2007, 卷号: 253, 页码: 3722-3726
Authors:  Wang P(王鹏);  Wang X(王霞);  Chen YM(陈友明);  Zhang GA(张广安);  Liu WM(刘维民);  Zhang JY(张俊彦)
Adobe PDF(688Kb)  |  Favorite  |  View/Download：151/3  |  Submit date：2013/11/01
Hydrogenated Amorphous Carbon (A-c:h) Films  Applied Bias Voltage  Filtered Cathodic Vacuum Arc (Fcva)