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| 类富勒烯碳膜的制备方法 专利 专利类型: 发明, 专利号: 200710308591.9, 申请日期: 2010-11-24, 公开日期: 2014-03-20 Inventors: 王鹏; 张俊彦; 刘维民 Adobe PDF(282Kb)  |  Favorite  |  View/Download:391/6  |  Submit date:2014/03/20 |
| Growth and structure of hydrogenated carbon films containing fullerene-like structure 期刊论文 Journal of Physics D:Applied Physics, 2008, 卷号: 41, 页码: 85401(1-7) Authors: Wang P(王鹏); Wang X(王霞); Liu WM(刘维民); Zhang JY(张俊彦) Adobe PDF(1659Kb)  |  Favorite  |  View/Download:448/20  |  Submit date:2013/03/28 |
| The effect of applied negative bias voltage on the structure of Ti-doped a-C:H films deposited by FCVA 期刊论文 Applied Surface Science, 2007, 卷号: 253, 页码: 3722-3726 Authors: Wang P(王鹏); Wang X(王霞); Chen YM(陈友明); Zhang GA(张广安); Liu WM(刘维民); Zhang JY(张俊彦) Adobe PDF(688Kb)  |  Favorite  |  View/Download:152/3  |  Submit date:2013/11/01 Hydrogenated Amorphous Carbon (A-c:h) Films Applied Bias Voltage Filtered Cathodic Vacuum Arc (Fcva) |
| Comparing internal stress in diamond-like carbon films with different structure 期刊论文 Thin Solid Films, 2007, 卷号: 515, 页码: 6899-6903 Authors: Wang P(王鹏); Wang X(王霞); Xu T(徐洮); Liu WM(刘维民); Zhang JY(张俊彦) Adobe PDF(213Kb)  |  Favorite  |  View/Download:293/3  |  Submit date:2013/11/01 Dlc Films Internal Stress Ti-interlayer Ti-doping Functional Gradient |