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The effect of applied negative bias voltage on the structure of Ti-doped a-C:H films deposited by FCVA 期刊论文
Applied Surface Science, 2007, 卷号: 253, 页码: 3722-3726
Authors:  Wang P(王鹏);  Wang X(王霞);  Chen YM(陈友明);  Zhang GA(张广安);  Liu WM(刘维民);  Zhang JY(张俊彦)
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Hydrogenated Amorphous Carbon (A-c:h) Films  Applied Bias Voltage  Filtered Cathodic Vacuum Arc (Fcva)  
Influence of nitrogen content on the structural, electrical and mechanical properties of CrNx thin films 期刊论文
Materials Science and Engineering A, 2007, 卷号: 460-461, 页码: 301-305
Authors:  Zhang GA(张广安);  Yan PX(阎鹏勋);  Wang P(王鹏);  Chen YM(陈友明);  Zhang JY(张俊彦)
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Twin Target Medium Frequency Magnetron Sputtering  Crnx Films  Deposition Rate  Structure  Wear Properties  
Comparing internal stress in diamond-like carbon films with different structure 期刊论文
Thin Solid Films, 2007, 卷号: 515, 页码: 6899-6903
Authors:  Wang P(王鹏);  Wang X(王霞);  Xu T(徐洮);  Liu WM(刘维民);  Zhang JY(张俊彦)
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Dlc Films  Internal Stress  Ti-interlayer  Ti-doping  Functional Gradient