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掺杂石墨烯的制备及电催化氧还原活性位点研究 学位论文
, 北京: 中国科学院大学, 2016
Authors:  潘富平
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氧还原反应  石墨烯  掺杂  活性位点  Oxygen Reduction Reaction  Graphene  Doping  Active Sites  
Mechanical and tribological properties of Ti-DLC films with different Ti content by magnetron sputtering technique 期刊论文
Applied Surface Science, 2012, 卷号: 258, 期号: 12, 页码: 5025-5030
Authors:  Cui JF;  Qiang L;  Zhang B;  Ling X;  Yang T;  Zhang JY(张俊彦)
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Diamond-like Carbon Film  Different ConcentraTion Ti Doping  Low ConcentraTion Ti Doping  Mechanical Properties  Tribological Performance  
The effect of applied negative bias voltage on the structure of Ti-doped a-C:H films deposited by FCVA 期刊论文
Applied Surface Science, 2007, 卷号: 253, 页码: 3722-3726
Authors:  Wang P(王鹏);  Wang X(王霞);  Chen YM(陈友明);  Zhang GA(张广安);  Liu WM(刘维民);  Zhang JY(张俊彦)
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Hydrogenated Amorphous Carbon (A-c:h) Films  Applied Bias Voltage  Filtered Cathodic Vacuum Arc (Fcva)  
The preparation and mechanical properties of Al-containing a-C:H thin films 期刊论文
Journal of Physics D: Applied Pysics, 2007, 卷号: 40, 页码: 6748-6753
Authors:  Zhang GA(张广安);  Yan PX(阎鹏勋);  Wang P(王鹏);  Chen YM(陈友明);  Zhang JY(张俊彦)
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Influence of nitrogen content on the structural, electrical and mechanical properties of CrNx thin films 期刊论文
Materials Science and Engineering A, 2007, 卷号: 460-461, 页码: 301-305
Authors:  Zhang GA(张广安);  Yan PX(阎鹏勋);  Wang P(王鹏);  Chen YM(陈友明);  Zhang JY(张俊彦)
Adobe PDF(358Kb)  |  Favorite  |  View/Download:279/3  |  Submit date:2013/11/01
Twin Target Medium Frequency Magnetron Sputtering  Crnx Films  Deposition Rate  Structure  Wear Properties