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The preparation and mechanical properties of Al-containing a-C:H thin films
Department固体润滑国家重点实验室
Zhang GA(张广安); Yan PX(阎鹏勋); Wang P(王鹏); Chen YM(陈友明); Zhang JY(张俊彦)
2007
Source PublicationJournal of Physics D: Applied Pysics
ISSN0022-3727
Volume40Pages:6748-6753
AbstractAl-containing hydrogenated amorphous carbon (Al–C :H) films were deposited on silicon substrates using a mid frequency magnetron sputtering Al target in an argon and methane gas mixture. The composition, surface morphology, hardness and friction coefficient of the films were characterized using x-ray photoelectron spectroscopy, atomic force microscopy, nanoindentation and tribological tester. The Al–C :H films deposited at low CH4 content show high surface roughness, low hardness and high friction coefficient, similar to metallic Al films; in contrast, the Al–C :H films prepared under high CH4 content indicate low surface roughness, high hardness and low friction coefficient, close to that of hard a-C :H films as wear-resistance films.
Subject Area材料科学与物理化学
Funding Organizationthe Natural Science Foundation of China (Grant Nos: 50572108;50432020);the “Hundred Talents Program” of the Chinese Academy of Science
Indexed BySCI
Language英语
Funding Project纳米润滑研究组
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/4045
Collection固体润滑国家重点实验室(LSL)
Corresponding AuthorZhang JY(张俊彦)
Recommended Citation
GB/T 7714
Zhang GA,Yan PX,Wang P,et al. The preparation and mechanical properties of Al-containing a-C:H thin films[J]. Journal of Physics D: Applied Pysics,2007,40:6748-6753.
APA 张广安,阎鹏勋,王鹏,陈友明,&张俊彦.(2007).The preparation and mechanical properties of Al-containing a-C:H thin films.Journal of Physics D: Applied Pysics,40,6748-6753.
MLA 张广安,et al."The preparation and mechanical properties of Al-containing a-C:H thin films".Journal of Physics D: Applied Pysics 40(2007):6748-6753.
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