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| Wear resistance of superior structural WS2-Sb2O3/Cu nanoscale multilayer film 期刊论文 Materials & design, 2016, 卷号: 93, 页码: 494-502 Authors: Xu SS(徐书生); Zheng JY(郑建云); Hao JY(郝俊英); Kong LG(孔良桂); Liu WM(刘维民); Hao JY(郝俊英); Liu WM(刘维民) Adobe PDF(3644Kb)  |  Favorite  |  View/Download:292/7  |  Submit date:2016/01/22 Ws2 Based Film Sb2o3 Doping Cu Sublayer Nanostructure Wear Resistance |
| Silicon and aluminum doping effects on the microstructure and properties of polymeric amorphous carbon films 期刊论文 Applied Surface Science, 2016, 卷号: 379, 页码: 358-366 Authors: Liu XQ(刘小强); Hao JY(郝俊英); Xie, Yuntao; Liu XQ(刘小强); Hao JY(郝俊英) Adobe PDF(2466Kb)  |  Favorite  |  View/Download:93/2  |  Submit date:2016/07/13 Polymeric Amorphous Carbon Nanostructure Mechanical Properties Super-low Friction Wear Resistance |
| Properties of a-C:H:Si thin films deposited by middle-frequency magnetron sputtering 期刊论文 Applied Surface Science, 2016, 卷号: 379, 页码: 516-522 Authors: Jiang JL(姜金龙); Wang, Yubao; Du, Jinfang; Yang, Hua; Hao JY(郝俊英); Jiang JL(姜金龙); Hao JY(郝俊英) Adobe PDF(1973Kb)  |  Favorite  |  View/Download:120/0  |  Submit date:2016/07/11 A-c:h:Si Films Magnetron Sputtering Structure Tribological Properties |
| Microstructure and property changes induced by substrate rotation in titanium/silicon dual-doped a-C:H films deposited by mid-frequency magnetron sputtering 期刊论文 Surface and Coatings Technology, 2014, 卷号: 240, 页码: 419-424 Authors: Jiang JL(姜金龙); Wang Q(王琼); Huang H(黄浩); Wang YB(王玉宝); Zhang X(张霞); Hao JY(郝俊英); Jiang JL(姜金龙) Adobe PDF(778Kb)  |  Favorite  |  View/Download:193/3  |  Submit date:2014/12/17 A-c:h Films Mf Magnetron Sputtering Substrate Rotation Microstructure And Property |
| Plasma Electrolytic Oxidation Coatings on Lightweight Metals 专著章节文集论文 出自: Modern Surface Engineering Treatments:Intech, 2013, 页码: 75-99 Authors: Li QB(李青彪); Liang J(梁军); Wang Q(王青) View  |  Adobe PDF(352Kb)  |  Favorite  |  View/Download:508/42  |  Submit date:2013/12/27 |
| Properties of TiN/TiCN multilayer films by direct current magnetron sputtering 期刊论文 Journal of Physics D: Applied Physics, 2012, 卷号: 45, 期号: 9, 页码: 095303(1-9) Authors: Zheng JY(郑建云); Hao JY(郝俊英); Liu XQ(刘小强); Liu WM(刘维民); Hao JY(郝俊英) Adobe PDF(1327Kb)  |  Favorite  |  View/Download:300/5  |  Submit date:2013/07/12 |