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Properties of TiN/TiCN multilayer films by direct current magnetron sputtering 期刊论文
Journal of Physics D: Applied Physics, 2012, 卷号: 45, 期号: 9, 页码: 095303(1-9)
Authors:  Zheng JY(郑建云);  Hao JY(郝俊英);  Liu XQ(刘小强);  Liu WM(刘维民);  Hao JY(郝俊英)
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The effect of applied negative bias voltage on the structure of Ti-doped a-C:H films deposited by FCVA 期刊论文
Applied Surface Science, 2007, 卷号: 253, 页码: 3722-3726
Authors:  Wang P(王鹏);  Wang X(王霞);  Chen YM(陈友明);  Zhang GA(张广安);  Liu WM(刘维民);  Zhang JY(张俊彦)
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Hydrogenated Amorphous Carbon (A-c:h) Films  Applied Bias Voltage  Filtered Cathodic Vacuum Arc (Fcva)  
Comparing internal stress in diamond-like carbon films with different structure 期刊论文
Thin Solid Films, 2007, 卷号: 515, 页码: 6899-6903
Authors:  Wang P(王鹏);  Wang X(王霞);  Xu T(徐洮);  Liu WM(刘维民);  Zhang JY(张俊彦)
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Dlc Films  Internal Stress  Ti-interlayer  Ti-doping  Functional Gradient