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| Comparative study on structure and properties of titanium/silicon mono- and co-doped amorphous carbon films deposited by mid-frequency magnetron sputtering 期刊论文 Surface and Interface Analysis, 2014, 卷号: 46, 期号: 3, 页码: 139-144 Authors: Jiang JL(姜金龙); Huang H(黄浩); Wang Q(王琼); Zhu WJ(朱伟军); Hao JY(郝俊英) ; Liu WM(刘维民) ; Jiang JL(姜金龙)
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| Preparation of superior lubricious amorphous carbon films co-doped by silicon and aluminum 期刊论文 Journal of Applied Physics, 2011, 卷号: 110, 页码: 53507(1-8) Authors: Liu XQ(刘小强) ; Hao JY(郝俊英) ; Yang J(杨军) ; Zheng JY(郑建云) ; Liang YM(梁永民); Liu WM(刘维民) ; Hao JY(郝俊英)![](/image/person.jpg)
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| Effect of deposition pressure on the adhesion and tribological properties of a-CNxH films prepared by DC-RF-PECVD 期刊论文 Journal of Materials Science, 2008, 卷号: 43, 页码: 645-651 Authors: Ding J(丁军); Hao JY(郝俊英) ; Xue QJ(薛群基) ; Liu WM(刘维民)![](/image/person.jpg)
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| Effect of N2/CH4 flow ratio on microstructure and composition of hydrogenated carbon nitride films prepared by a dual DC-RF plasma system 期刊论文 Journal of Non-Crystalline Solids, 2007, 卷号: 353, 页码: 136-142 Authors: Hao JY(郝俊英) ; Liu WM(刘维民) ; Xue QJ(薛群基)![](/image/person.jpg)
Adobe PDF(201Kb)  |   Favorite  |  View/Download:272/2  |  Submit date:2013/11/01 Films And Coatings Chemical Vapor Deposition Plasma Deposition Vapor Phase Deposition Hardness Indentation Microindentation Microstructure Ftir Measurements Xps |