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超低摩擦硅铝二元掺杂非晶碳薄膜的制备方法 专利
专利类型: 发明, 专利号: 201110425150.3, 申请日期: 2015-07-08, 公开日期: 2013-06-19
Inventors:  郝俊英;  刘小强
Adobe PDF(326Kb)  |  Favorite  |  View/Download：276/11  |  Submit date：2015/07/13
Substrate Temperature Effect on the Microstructure and Properties of (Si, Al)/a-C: H Films Prepared through Magnetron Sputtering Deposition 期刊论文
Journal of Nanomaterials, 2015, 页码: 194308(1-9)
Authors:  Liu XQ(刘小强);  Hao JY(郝俊英);  Yang, Hu;  Lin, Xiuzhou;  Zeng, Xianguang
Adobe PDF(4684Kb)  |  Favorite  |  View/Download：133/2  |  Submit date：2015/11/23