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Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering 期刊论文
Applied Surface Science, 2012, 卷号: 258, 期号: 8, 页码: 3864-3870
Authors:  Lv YH(吕艳红);  Ji L(吉利);  Liu XH(刘晓红);  Li HX(李红轩);  Zhou HD(周惠娣);  Chen JM(陈建敏);  Li HX(李红轩)
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Craln Films  Microstructure  Mechanical Properties  Corrosion Resistance  
One-step process for the fabrication of superhydrophobic surfaces with easy repairability 期刊论文
Applied Surface Science, 2012, 卷号: 258, 期号: 7, 页码: 3115-3118
Authors:  Li J(李健);  Wan HQ(万宏启);  Ye YP(冶银平);  Zhou HD(周惠娣);  Chen JM(陈建敏);  Chen JM(陈建敏)
Adobe PDF(523Kb)  |  Favorite  |  View/Download:347/0  |  Submit date:2013/07/12
Superhydrophobic  Contact Angle  Self-cleaning Property  Repairability  
One-step process to fabrication of transparent superhydrophobic SiO2 paper 期刊论文
Applied Surface Science, 2012, 卷号: 261, 页码: 470-472
Authors:  Li J(李健);  Wan HQ(万宏启);  Ye YP(冶银平);  Zhou HD(周惠娣);  Chen JM(陈建敏);  Chen JM(陈建敏)
Adobe PDF(476Kb)  |  Favorite  |  View/Download:324/0  |  Submit date:2013/07/12
Superhydrophobic Paper  Transparent  Sio2 Nanoparticles  Contact Angle  
Facile fabrication of superhydrophobic ZnO nanoparticle surfaces with erasable and rewritable wettability 期刊论文
Applied Surface Science, 2012, 卷号: 258, 期号: 22, 页码: 8585-8589
Authors:  Li J(李健);  Wan HQ(万宏启);  Liu XH(刘晓红);  Ye YP(冶银平);  Zhou HD(周惠娣);  Chen JM(陈建敏);  Chen JM(陈建敏)
Adobe PDF(566Kb)  |  Favorite  |  View/Download:272/0  |  Submit date:2013/07/12
Superhydrophobic  Contact Angle  Zno  Rewritable  
Composition, microstructure, and properties of CrNx films deposited using medium frequency magnetron sputtering 期刊论文
Applied Surface Science, 2011, 卷号: 257, 期号: 无期, 页码: 2269-2274
Authors:  Kong QH(孔庆花);  Ji L(吉利);  Li HX(李红轩);  Liu XH(刘晓红);  Wang YJ(王永军);  Chen JM(陈建敏);  Zhou HD(周惠娣)
Adobe PDF(921Kb)  |  Favorite  |  View/Download:219/2  |  Submit date:2012/09/24
Crnx FIlms  Medium Frequency Magnetron Sputtering  N2 Content  Microstructure  Mechanical Properties  Tribological Properties  
A magnetron sputtering technique to prepare a-C:H films: Effect of substrate bias 期刊论文
Applied Surface Science, 2011, 卷号: 257, 页码: 1990-1995
Authors:  Wang YX(王永霞);  Ye YP(冶银平);  Li HX(李红轩);  Ji L(吉利);  Chen JM(陈建敏);  Zhou HD(周惠娣)
Adobe PDF(1086Kb)  |  Favorite  |  View/Download:323/1  |  Submit date:2012/09/24
A-c:h FIlm  Magnetron Sputtering  Substrate Bias  Microstructure  Tribological Property