| Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering | |
| Department | 先进润滑与防护材料研究发展中心 |
Lv YH(吕艳红)1,2; Ji L(吉利)1 ; Liu XH(刘晓红)1; Li HX(李红轩)1; Zhou HD(周惠娣)1; Chen JM(陈建敏)1; Li HX(李红轩)
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| 2012 | |
| Source Publication | Applied Surface Science
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| ISSN | 0169-4332 |
| Volume | 258Issue:8Pages:3864-3870 |
| Abstract | The CrAlN films were deposited on silicon and stainless steel substrates by unbalanced magnetron sputtering system. The influence of substrate bias on deposition rate, composition, structure, morphology and properties of the CrAlN films was investigated. The results showed that, with the increase of the substrate bias voltage, the deposition rate decreased accompanied by a change of the preferred orientation of the CrAlN film from (220) to (200). The grain size and the average surface roughness of the CrAlN films declined as the bias voltage increases above -100 V. The morphology of the films changed from obviously columnar to dense glass-like structure with the increase of the bias voltage from -50 to -250 V. Meanwhile, the films deposited at moderate bias voltage had better mechanical and tribological properties, while the films deposited at higher bias voltage showed better corrosion resistance. It was found that the corrosion resistance improvement was not only attributed to the low pinhole density of the film, but also to chemical composition of films. |
| Keyword | Craln Films Microstructure Mechanical Properties Corrosion Resistance |
| Subject Area | 材料科学与物理化学 |
| DOI | 10.1016/j.apsusc.2011.12.048 |
| Funding Organization | the National Natural Science Foundation of China (Grant no. 50705093);the Innovative Group Foundation from NSFC (Grant no. 50421502) |
| Indexed By | SCI |
| Language | 英语 |
| Funding Project | 磨损和表面工程组 |
| compositor | 第一作者单位 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.licp.cn/handle/362003/3288 |
| Collection | 固体润滑国家重点实验室（LSL） 中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心 |
| Corresponding Author | Li HX(李红轩) |
| Affiliation | 1.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China 2.Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China |
| Recommended Citation GB/T 7714 | Lv YH,Ji L,Liu XH,et al. Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering[J]. Applied Surface Science,2012,258(8):3864-3870. |
| APA | Lv YH.,Ji L.,Liu XH.,Li HX.,Zhou HD.,...&李红轩.(2012).Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering.Applied Surface Science,258(8),3864-3870. |
| MLA | Lv YH,et al."Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering".Applied Surface Science 258.8(2012):3864-3870. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 3864-3870.PDF（1111KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text | |
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