| A magnetron sputtering technique to prepare a-C:H films: Effect of substrate bias | |
| Department | 固体润滑国家重点实验室 ; 先进润滑与防护材料研究发展中心 |
Wang YX(王永霞); Ye YP(冶银平) ; Li HX(李红轩); Ji L(吉利); Chen JM(陈建敏); Zhou HD(周惠娣)
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| 2011 | |
| Source Publication | Applied Surface Science
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| ISSN | 0169-4332 |
| Volume | 257Pages:1990-1995 |
| Abstract | Amorphous hydrogenated carbon (a-C:H) films were deposited bymagnetron sputtering with amixture gas of Ar and CH4. The a-C:H films deposited by this method have relatively low internal stress (<1GPa) compared to some films deposited by conventional deposition process. The effects of substrate bias voltage onmicrostructure, surfacemorphology andmechanical properties of the filmswere investigated by various techniques. It has been found that the polymer-like structure is dominated at lowbias voltage (−100V), while the diamond-like structure with the highest hardness and internal stress is the main feature of the a-C:H films deposited under high bias voltage (−300V). With increasing the bias voltage further, the feature of diamond-like structure decreases associating with the increase of graphitization. The frictional test shows that the friction coefficient and wear rate of the a-C:H films are depended strongly on structure and mechanical properties, which were ultimately influenced by the deposition method and bias voltage. |
| Keyword | A-c:h FIlm Magnetron Sputtering Substrate Bias Microstructure Tribological Property |
| Subject Area | 材料科学与物理化学 |
| Funding Organization | the National Natural Science Foundation of China (Grant NO.50705093);the Innovative Group Foundation from NSFC (Grant NO.50421502) |
| Indexed By | SCI |
| Language | 英语 |
| Funding Project | 磨损和表面工程组 |
| Document Type | 期刊论文 |
| Identifier | http://ir.licp.cn/handle/362003/685 |
| Collection | 固体润滑国家重点实验室（LSL） 中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心 |
| Corresponding Author | Ye YP(冶银平) |
| Recommended Citation GB/T 7714 | Wang YX,Ye YP,Li HX,et al. A magnetron sputtering technique to prepare a-C:H films: Effect of substrate bias[J]. Applied Surface Science,2011,257:1990-1995. |
| APA | 王永霞,冶银平,李红轩,吉利,陈建敏,&周惠娣.(2011).A magnetron sputtering technique to prepare a-C:H films: Effect of substrate bias.Applied Surface Science,257,1990-1995. |
| MLA | 王永霞,et al."A magnetron sputtering technique to prepare a-C:H films: Effect of substrate bias".Applied Surface Science 257(2011):1990-1995. |
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| 20111990-1995.PDF（1086KB） | 开放获取 | License | View Application Full Text | |||
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