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中国科学院兰州化学物理研究所机构知识库
KMS Lanzhou Institute of Chemical Physics,Chinese Academy of Sciences
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Indexed By:SCI
Source Publication:Surface and Coatings Technology
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The microstructure, mechanical and tribological properties of a-C:H films with self-assembled carbon nanohoops
期刊论文
Surface and Coatings Technology, 2017, 卷号: 311, 期号: 0, 页码: 27-34
Authors:
Han, Xi(韩熙)
;
Zheng JY(郑建云)
;
Hao JY(郝俊英)
;
Zhang, Shuaituo
;
Zheng JY(郑建云)
;
Hao JY(郝俊英)
Adobe PDF(1600Kb)
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Submit date:2017/04/27
A-c:h Film
Carbon Nanohoops
Microstructure
Mechanical And Tribological Properties
Microstructure and property changes induced by substrate rotation in titanium/silicon dual-doped a-C:H films deposited by mid-frequency magnetron sputtering
期刊论文
Surface and Coatings Technology, 2014, 卷号: 240, 页码: 419-424
Authors:
Jiang JL(姜金龙)
;
Wang Q(王琼)
;
Huang H(黄浩)
;
Wang YB(王玉宝)
;
Zhang X(张霞)
;
Hao JY(郝俊英)
;
Jiang JL(姜金龙)
Adobe PDF(778Kb)
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Submit date:2014/12/17
A-c:h Films
Mf Magnetron Sputtering
Substrate Rotation
Microstructure And Property
Microstructure and mechanical properties of graphitic a-C:H:Si films
期刊论文
Surface and Coatings Technology, 2012, 卷号: 206, 期号: 16, 页码: 3467-3471
Authors:
Zhao F(赵飞)
;
Li HX(李红轩)
;
Ji L(吉利)
;
Wang YJ(王永军)
;
Mo YF(莫宇飞)
;
Quan WL(权伟龙)
;
Kong QH(孔庆花)
;
Wang YX(王永霞)
;
Chen JM(陈建敏)
;
Zhou HD(周惠娣)
;
Chen JM(陈建敏)
Adobe PDF(592Kb)
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View/Download:109/0
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Submit date:2016/04/25
Graphitic
Carbon Film
Si-doped
Xps
Raman
Microstructure and tribological properties of the a-C:H films deposited by magnetron sputtering with CH4 /Ar mixture
期刊论文
Surface and Coatings Technology, 2011, 卷号: 205, 页码: 4577-4581
Authors:
Wang YX(王永霞)
;
Ye YP(冶银平)
;
Li HX(李红轩)
;
Ji L(吉利)
;
Wang YJ(王永军)
;
Liu XJ(刘晓军)
;
Chen JM(陈建敏)
;
Zhou HD(周惠娣)
Adobe PDF(770Kb)
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Submit date:2012/09/24
A-c:h FIlm
Magnetron Sputtering
Microstructure
Tribological Property
The effect of applied substrate negative bias voltage on the structure and properties of Al-containing a-C:H thin films
期刊论文
Surface and Coatings Technology, 2008, 卷号: 202, 页码: 2684-2689
Authors:
Zhang GA(张广安)
;
Yan PX(阎鹏勋)
;
Wang P(王鹏)
;
Chen YM(陈友明)
;
Zhang JY(张君英)
;
Wang LP(王立平)
;
Zhang JY(张俊彦)
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Submit date:2013/03/28
Al-containing Hydrogenated Amorphous Carbon
Magnetron Sputtering
Applied Substrate Pulse Bias
Hardness
Wear Test