Microstructure and mechanical properties of graphitic a-C:H:Si films
Department先进润滑与防护材料研究发展中心
Zhao F(赵飞)1,2; Li HX(李红轩)1; Ji L(吉利)1; Wang YJ(王永军)1; Mo YF(莫宇飞)3; Quan WL(权伟龙)1; Kong QH(孔庆花)1; Wang YX(王永霞)1; Chen JM(陈建敏)1; Zhou HD(周惠娣)1; Chen JM(陈建敏)
The second department固体润滑国家重点实验室
2012
Source PublicationSurface and Coatings Technology
ISSN0257-8972
Volume206Issue:16Pages:3467-3471
AbstractA series of graphitic a-C:H:Si films with different Si content were prepared by altering the sputtering current in a hybrid RF-PECVD and magnetron sputtering system. Microstructures and mechanical properties of them were characterized by IR, Raman, XPS, nanoindentation and scratch tests. Results show that although the sp3/sp2 ratio increases with increasing Si content and as high as 8.2 at.% of silicon was doped, the a-C:H:Si films remain graphitic in nature and the ID/IG ratio is nearly constant for all. The coupling effects of sputtering-induced heating and strong ion bombarding due to negatively biasing were considered to be responsible for the film graphitization. The graphitic nature also accounts for the lower nanohardness of prepared a-C:H:Si films than the diamond-like a-C:H and a-C:H:Si films.
KeywordGraphitic Carbon Film Si-doped Xps Raman
Subject Area材料科学与物理化学
DOI10.1016/j.surfcoat.2012.02.013
Funding Organizationthe National Natural Science Foundation of China (Grant No.50705093;No.50575217);the Innovative Group Foundation from NSFC (Grant No.50421502);the National 973 Project (No.2007 CB607601)
Indexed BySCI
If1.941
Language英语
Funding Project磨损与表面工程课题组
compositor第一作者单位
Citation statistics
Cited Times:6[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/19541
Collection中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心
固体润滑国家重点实验室(LSL)
Corresponding AuthorChen JM(陈建敏)
Affiliation1.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
2.Henan Univ Sci & Technol, Sch Mat Sci & Engn, Luoyang, Peoples R China
3.Guangxi Univ, Sch Chem & Chem Engn, Nanning 530004, Peoples R China
Recommended Citation
GB/T 7714
Zhao F,Li HX,Ji L,et al. Microstructure and mechanical properties of graphitic a-C:H:Si films[J]. Surface and Coatings Technology,2012,206(16):3467-3471.
APA Zhao F.,Li HX.,Ji L.,Wang YJ.,Mo YF.,...&陈建敏.(2012).Microstructure and mechanical properties of graphitic a-C:H:Si films.Surface and Coatings Technology,206(16),3467-3471.
MLA Zhao F,et al."Microstructure and mechanical properties of graphitic a-C:H:Si films".Surface and Coatings Technology 206.16(2012):3467-3471.
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