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Modulation of the excited-electron recombination process by introduce g-C3N4 on Bi-based bimetallic oxides photocatalyst 期刊论文
Applied Surface Science, 2017, 卷号: 423, 页码: 255-265
Authors:  Liu, Duanduan;  Jin ZL(靳治良);  Li HX(李红轩);  Lu GX(吕功煊);  Jin ZL(靳治良)
Adobe PDF(3329Kb)  |  Favorite  |  View/Download：157/3  |  Submit date：2017/11/24
Photocatalyst  Bi7.53co0.47o11.92  G-c3n4  H2-production  Composite Photocatalyst  
Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering 期刊论文
Applied Surface Science, 2012, 卷号: 258, 期号: 8, 页码: 3864-3870
Authors:  Lv YH(吕艳红);  Ji L(吉利);  Liu XH(刘晓红);  Li HX(李红轩);  Zhou HD(周惠娣);  Chen JM(陈建敏);  Li HX(李红轩)
Adobe PDF(1111Kb)  |  Favorite  |  View/Download：350/1  |  Submit date：2013/07/12
Craln Films  Microstructure  Mechanical Properties  Corrosion Resistance  
A magnetron sputtering technique to prepare a-C:H films: Effect of substrate bias 期刊论文
Applied Surface Science, 2011, 卷号: 257, 页码: 1990-1995
Authors:  Wang YX(王永霞);  Ye YP(冶银平);  Li HX(李红轩);  Ji L(吉利);  Chen JM(陈建敏);  Zhou HD(周惠娣)
Adobe PDF(1086Kb)  |  Favorite  |  View/Download：325/1  |  Submit date：2012/09/24
A-c:h FIlm  Magnetron Sputtering  Substrate Bias  Microstructure  Tribological Property