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Argon ion beam assisted magnetron sputtering deposition of boron-doped a-Si:H thin films with improved conductivity 期刊论文
Journal of Non-Crystalline Solids, 2013, 卷号: 378, 页码: 177-180
Authors:  Wang LQ(王凌倩);  Wang, Weiyan;  Huang, Junjun;  Zeng, Yuheng;  Tan, Ruiqin;  Song, Weijie;  Chen JM(陈建敏);  Chen JM(陈建敏)
Adobe PDF(553Kb)  |  Favorite  |  View/Download：107/1  |  Submit date：2015/10/19
Argon Ion Beam Assisted Magnetron Sputtering  Boron-doped A-si:h Thin Film  Dark Conductivity  
Effect of N2/CH4 flow ratio on microstructure and composition of hydrogenated carbon nitride films prepared by a dual DC-RF plasma system 期刊论文
Journal of Non-Crystalline Solids, 2007, 卷号: 353, 页码: 136-142
Authors:  Hao JY(郝俊英);  Liu WM(刘维民);  Xue QJ(薛群基)
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Films And Coatings  Chemical Vapor Deposition  Plasma Deposition  Vapor Phase Deposition  Hardness  Indentation  Microindentation  Microstructure  Ftir Measurements  Xps  
Effect of deposition pressure on microstructure and properties of hydrogenated carbon nitride films prepared by DC-RF-PECVD 期刊论文
Journal of Non-Crystalline Solids, 2005, 卷号: 351, 页码: 3671-3676
Authors:  Hao JY(郝俊英);  Xu T(徐洮);  Liu WM(刘维民);  Liu WM(刘维民)
Adobe PDF(173Kb)  |  Favorite  |  View/Download：218/1  |  Submit date：2014/12/23