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| 氮化铬硬质膜的制备及其性能研究 学位论文
: 中国科学院研究生院, 2011
Authors: 孔庆花
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Crnx薄膜 中频脉冲磁控溅射 工艺参数 微观结构 摩擦学性能 Crnx Films Medium Frequency Pulse Magnetron Sputtering Deposition Parameters Microstructure Tribological Properties |
| 磁控溅射法制备含氢非晶碳膜及其结构和性能研究 学位论文
: 中国科学院研究生院, 2011
Authors: 王永霞
Adobe PDF(2699Kb) | Favorite | View/Download：302/0 | Submit date：2012/11/09
含氢非晶碳膜 磁控溅射法 内应力 热稳定性 Hydrogenated Amorphous Carbon Film Magnetron Sputtering Internal Stress Thermal Stability |
| Composition, microstructure, and properties of CrNx films deposited using medium frequency magnetron sputtering 期刊论文
Applied Surface Science, 2011, 卷号: 257, 期号: 无期, 页码: 2269-2274
Authors: Kong QH(孔庆花); Ji L(吉利) ; Li HX(李红轩); Liu XH(刘晓红); Wang YJ(王永军); Chen JM(陈建敏); Zhou HD(周惠娣)
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Crnx FIlms Medium Frequency Magnetron Sputtering N2 Content Microstructure Mechanical Properties Tribological Properties |
| 氮气流量对中频非平衡反应磁控溅射制备CrAlN薄膜性能的影响 期刊论文
中国表面工程, 2011, 卷号: 24, 期号: 4, 页码: 7-12
Authors: 吕艳红; 孔庆花; 吉利; 李红轩; 刘晓红; 陈建敏; 周惠娣
Adobe PDF(1174Kb) | Favorite | View/Download：333/0 | Submit date：2012/09/24
磁控溅射 Craln 薄膜 微观结构 硬度 腐蚀 Magnetron Sputtering Craln Film Microstructre Hardness Corrosion |
| Microstructure, mechanical and tribological properties of graphite-like amorphous carbon films prepared by unbalanced magnetron sputtering 期刊论文
Surface and Coatings Technology, 2011, 卷号: 205, 页码: 3058-3065
Authors: Wang YJ(王永军); Li HX(李红轩); Ji L(吉利); Zhao F(赵飞); Kong QH(孔庆花); Wang YX(王永霞); Liu XH(刘晓红); Quan WL(权伟龙); Zhou HD(周惠娣); Chen JM(陈建敏)
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Unbalanced Magnetron Sputtering Bias Voltage Graphite-like Carbon FIlm Microstructure Tribological Properties |
| Microstructure and tribological properties of the a-C:H films deposited by magnetron sputtering with CH4 /Ar mixture 期刊论文
Surface and Coatings Technology, 2011, 卷号: 205, 页码: 4577-4581
Authors: Wang YX(王永霞); Ye YP(冶银平); Li HX(李红轩); Ji L(吉利); Wang YJ(王永军); Liu XJ(刘晓军); Chen JM(陈建敏); Zhou HD(周惠娣)
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A-c:h FIlm Magnetron Sputtering Microstructure Tribological Property |
| A magnetron sputtering technique to prepare a-C:H films: Effect of substrate bias 期刊论文
Applied Surface Science, 2011, 卷号: 257, 页码: 1990-1995
Authors: Wang YX(王永霞); Ye YP(冶银平); Li HX(李红轩); Ji L(吉利); Chen JM(陈建敏); Zhou HD(周惠娣)
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A-c:h FIlm Magnetron Sputtering Substrate Bias Microstructure Tribological Property |
