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Low temperature preparation of transparent, antireflective TiO2 films deposited at different O-2/Ar ratios by microwave electron cyclotron resonance magnetron sputtering 期刊论文
Vacuum, 2012, 卷号: 86, 期号: 9, 页码: 1387-1392
Authors:  Du W(杜雯);  Ye YP(冶银平);  Li HX(李红轩);  Zhao F(赵飞);  Ji L(吉利);  Quan WL(权伟龙);  Chen JM(陈建敏);  Zhou HD(周惠娣);  Chen JM(陈建敏)
Adobe PDF(978Kb)  |  Favorite  |  View/Download：416/4  |  Submit date：2013/07/12
Titanium Oxide Thin Film  Mw-ecr  O-2/ar Ratio  Antireflection  
含氢碳膜生长、结构和性能的计算机模拟研究 学位论文
: 中国科学院研究生院, 2010
Authors:  权伟龙
Adobe PDF(5040Kb)  |  Favorite  |  View/Download：354/0  |  Submit date：2012/11/09
含氢碳膜  分子动力学模拟  薄膜生长  纳米压痕  热稳定性  Hydrogenated Carbon Film  Molecular Dynamical Simulations  Film Growth  Nano-indentation  Hermal Stability