| Low temperature preparation of transparent, antireflective TiO2 films deposited at different O-2/Ar ratios by microwave electron cyclotron resonance magnetron sputtering | |
| Department | 先进润滑与防护材料研究发展中心 |
Du W(杜雯)1,2; Ye YP(冶银平)1 ; Li HX(李红轩)1; Zhao F(赵飞)1,2; Ji L(吉利)1; Quan WL(权伟龙)1,2; Chen JM(陈建敏)1; Zhou HD(周惠娣)1; Chen JM(陈建敏)
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| The second department | 固体润滑国家重点实验室 |
| 2012 | |
| Source Publication | Vacuum
 |
| ISSN | 0042-207X |
| Volume | 86Issue:9Pages:1387-1392 |
| Abstract | A serial of crystalline titanium oxide ceramic films were deposited at low temperature using microwave electron cyclotron resonance (MW-ECR) magnetron sputtering with different O2/Ar ratios. The influences of O2/Ar ratio on the deposition rate, morphology, crystalline nature, optical adsorption property of the obtained titanium oxide thin films were investigated by means of X-ray diffraction (XRD), atomic force microscopy (AFM) and UVeVis spectra. Therefore, the optimum O2/Ar ratio for deposition of anatase TiO2 thin films on unheated glass substrate was realized in a MW-ECR magnetron sputtering process. The asdeposited anatase TiO2 films were transparent and were antireflective in the visible region. |
| Keyword | Titanium Oxide Thin Film Mw-ecr O-2/ar Ratio Antireflection |
| Subject Area | 材料科学与物理化学 |
| DOI | 10.1016/j.vacuum.2012.01.012 |
| Funding Organization | the Ministry of Science and Technology of China (“973” plan, 2007CB607601);the Innovation Program Foundation (50421502);National Natural Science Foundation of China (50575217;50705093) |
| Indexed By | SCI |
| Language | 英语 |
| Funding Project | 磨损和表面工程组 |
| compositor | 第一作者单位 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.licp.cn/handle/362003/3512 |
| Collection | 固体润滑国家重点实验室（LSL） 中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心 |
| Corresponding Author | Chen JM(陈建敏) |
| Affiliation | 1.Chinese Acad Sci, Lanzhou Inst Chem & Phys, Lanzhou 730000, Peoples R China 2.Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China |
| Recommended Citation GB/T 7714 | Du W,Ye YP,Li HX,et al. Low temperature preparation of transparent, antireflective TiO2 films deposited at different O-2/Ar ratios by microwave electron cyclotron resonance magnetron sputtering[J]. Vacuum,2012,86(9):1387-1392. |
| APA | Du W.,Ye YP.,Li HX.,Zhao F.,Ji L.,...&陈建敏.(2012).Low temperature preparation of transparent, antireflective TiO2 films deposited at different O-2/Ar ratios by microwave electron cyclotron resonance magnetron sputtering.Vacuum,86(9),1387-1392. |
| MLA | Du W,et al."Low temperature preparation of transparent, antireflective TiO2 films deposited at different O-2/Ar ratios by microwave electron cyclotron resonance magnetron sputtering".Vacuum 86.9(2012):1387-1392. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 1387-1392.PDF（978KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text | |
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