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The effect of applied substrate negative bias voltage on the structure and properties of Al-containing a-C:H thin films 期刊论文
Surface and Coatings Technology, 2008, 卷号: 202, 页码: 2684-2689
Authors:  Zhang GA(张广安);  Yan PX(阎鹏勋);  Wang P(王鹏);  Chen YM(陈友明);  Zhang JY(张君英);  Wang LP(王立平);  Zhang JY(张俊彦)
Adobe PDF(1278Kb)  |  Favorite  |  View/Download：128/2  |  Submit date：2013/03/28
Al-containing Hydrogenated Amorphous Carbon  Magnetron Sputtering  Applied Substrate Pulse Bias  Hardness  Wear Test  
The effect of applied negative bias voltage on the structure of Ti-doped a-C:H films deposited by FCVA 期刊论文
Applied Surface Science, 2007, 卷号: 253, 页码: 3722-3726
Authors:  Wang P(王鹏);  Wang X(王霞);  Chen YM(陈友明);  Zhang GA(张广安);  Liu WM(刘维民);  Zhang JY(张俊彦)
Adobe PDF(688Kb)  |  Favorite  |  View/Download：152/3  |  Submit date：2013/11/01
Hydrogenated Amorphous Carbon (A-c:h) Films  Applied Bias Voltage  Filtered Cathodic Vacuum Arc (Fcva)  
Influence of nitrogen content on the structural, electrical and mechanical properties of CrNx thin films 期刊论文
Materials Science and Engineering A, 2007, 卷号: 460-461, 页码: 301-305
Authors:  Zhang GA(张广安);  Yan PX(阎鹏勋);  Wang P(王鹏);  Chen YM(陈友明);  Zhang JY(张俊彦)
Adobe PDF(358Kb)  |  Favorite  |  View/Download：279/3  |  Submit date：2013/11/01
Twin Target Medium Frequency Magnetron Sputtering  Crnx Films  Deposition Rate  Structure  Wear Properties