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Resistive switching behaviors and mechanisms of HfS2 film memory devices studied by experiments and density functional theory calculations
Department固体润滑国家重点实验室(LSL)
Naifeng Li1; Yue Wang1; Haifeng Sun2; Junjie Hu1; Maoyuan Zheng1; Sihao Ye1; Qi Wang1; Yingtao Li1; Deyan He1; Jiatai Wang3; Guangan Zhang4; Jing Qi1
The second department低维润滑材料研究组
2020
Source PublicationApplied Physics Letters
Volume6Issue:16Pages:063503
If3.597
Language英语
compositor第四作者单位
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/26877
Collection固体润滑国家重点实验室(LSL)
Corresponding AuthorJing Qi
Affiliation1.Key Laboratory of Special Function Materials and Structure Design, Ministry of Education, School of Physical Science and Technology, Lanzhou University
2.Western Theater Army
3.School of Physics and Electronic Information Engineering, Qinghai Normal University
4.State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemicals Physics, Chinese Academy of Sciences
Recommended Citation
GB/T 7714
Naifeng Li,Yue Wang,Haifeng Sun,et al. Resistive switching behaviors and mechanisms of HfS2 film memory devices studied by experiments and density functional theory calculations[J]. Applied Physics Letters,2020,6(16):063503.
APA Naifeng Li.,Yue Wang.,Haifeng Sun.,Junjie Hu.,Maoyuan Zheng.,...&Jing Qi.(2020).Resistive switching behaviors and mechanisms of HfS2 film memory devices studied by experiments and density functional theory calculations.Applied Physics Letters,6(16),063503.
MLA Naifeng Li,et al."Resistive switching behaviors and mechanisms of HfS2 film memory devices studied by experiments and density functional theory calculations".Applied Physics Letters 6.16(2020):063503.
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