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In-situ stress suppression of hydrogenated a-CNx film prepared via Ar gas introduction 期刊论文
Surface and Interface Analysis, 2017, 卷号: 49, 期号: 5, 页码: 370-375
Authors:  Wang, Qi;  He, Deyan;  Zhang JY(张俊彦)
Adobe PDF(434Kb)  |  Favorite  |  View/Download:127/4  |  Submit date:2017/05/10
Amorphous Carbon  Carbon Nitride Films  Stress  Raman  
Preparation and study of carbon nano-onion for lithium storage 期刊论文
Materials Chemistry and Physics, 2013, 卷号: 139, 期号: 1, 页码: 333-337
Authors:  Wang Q(王琦);  Sun XL(孙晓雷);  He DY(贺德衍);  Zhang JY(张俊彦);  He DY(贺德衍)
Adobe PDF(1066Kb)  |  Favorite  |  View/Download:113/3  |  Submit date:2015/09/08
Nanostructures  Electrochemical Properties  Defects  Raman Spectroscopy And Scattering  
The chemical composition and bonding structure of amorphous hydrogenated carbon nitride film on aluminum surface deposited by electrodeposition 期刊论文
Surface and Interface Analysis, 2011, 卷号: 43, 页码: 823-826
Authors:  Yu YL(于元烈);  Zhang JY(张俊彦)
Adobe PDF(238Kb)  |  Favorite  |  View/Download:229/5  |  Submit date:2012/09/24
Electrodeposition  Characterization  Raman  Xps  Ftir  
The chemical composition and bonding structureofB–C–N–H thin films deposited by reactive magnetron sputtering 期刊论文
Surface and Interface Analysis, 2009, 卷号: 41, 页码: 865-871
Authors:  陈友明;  杨生荣;  张俊彦
Adobe PDF(364Kb)  |  Favorite  |  View/Download:175/0  |  Submit date:2012/11/13
B–c–n–h FIlm  Magnetron Sputtering  Xps  Ftir  Raman  
The infrared characteristics investigation of carbon nitride films 期刊论文
Diamond and Related Materials, 2008, 卷号: 17, 页码: 174-179
Authors:  Wang CB(王成兵);  Yang SR(杨生荣);  Zhang JY(张俊彦)
Adobe PDF(533Kb)  |  Favorite  |  View/Download:144/3  |  Submit date:2013/03/28
Carbon Nitride Films  Infrared Spectra  Raman Spectra  
Facile synthesis of CNTs-doped diamond-like carbon film by electrodeposition 期刊论文
Surface and Coatings Technology, 2008, 卷号: 202, 页码: 5943-5946
Authors:  Hu HY(胡红艳);  Chen G(陈刚);  Zhang JY(张俊彦)
Adobe PDF(628Kb)  |  Favorite  |  View/Download:377/14  |  Submit date:2013/03/28
Cnts  Dlc FIlm  Electrodeposition  Raman  Hardness  Residual Stress