In-situ stress suppression of hydrogenated a-CNx film prepared via Ar gas introduction | |
Department | 先进润滑与防护材料研究发展中心 |
Wang, Qi1; He, Deyan1; Zhang JY(张俊彦)2 | |
The second department | 固体润滑国家重点实验室 |
2017 | |
Source Publication | Surface and Interface Analysis |
ISSN | 0142-2421 |
Volume | 49Issue:5Pages:370-375 |
Abstract | Evolution of hydrogenated amorphous carbon nitride films was investigated with an introduction of Ar gas in the deposition. The results showed that compressive stress of the films decreased versus an increase of Ar flow rate. Especially, at an Ar flow rate of 5 sccm the film exhibited lower compressive stress, higher hardness and lower root-mean-square (rms) roughness than the films deposited without Ar gas introduction. Structural analysis showed that the films with higher hardness, low compressive stress and lower rms roughness had relatively high sp2 and nitrogen content. It was attributed to the assistance of Ar plasma, which can cause N atom to enter graphite ring easily and form curved graphite microstructure. |
Keyword | Amorphous Carbon Carbon Nitride Films Stress Raman |
Subject Area | 材料科学与物理化学 |
DOI | 10.1002/sia.6140 |
Indexed By | SCI |
If | 1.132 |
Language | 英语 |
Funding Project | 纳米润滑研究组 |
compositor | 第二作者单位 |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.licp.cn/handle/362003/21742 |
Collection | 中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心 固体润滑国家重点实验室(LSL) |
Corresponding Author | Wang, Qi |
Affiliation | 1.Lanzhou Univ, Sch Phys, Lanzhou 730000, Peoples R China 2.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China |
Recommended Citation GB/T 7714 | Wang, Qi,He, Deyan,Zhang JY. In-situ stress suppression of hydrogenated a-CNx film prepared via Ar gas introduction[J]. Surface and Interface Analysis,2017,49(5):370-375. |
APA | Wang, Qi,He, Deyan,&Zhang JY.(2017).In-situ stress suppression of hydrogenated a-CNx film prepared via Ar gas introduction.Surface and Interface Analysis,49(5),370-375. |
MLA | Wang, Qi,et al."In-situ stress suppression of hydrogenated a-CNx film prepared via Ar gas introduction".Surface and Interface Analysis 49.5(2017):370-375. |
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Wang_et_al-2017-Surf(434KB) | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text |
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