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Effects of Al incorporation on the mechanical and tribological properties of Ti-doped a-C:H films deposited by magnetron sputtering 期刊论文
Current Applied Physics, 2011, 卷号: 11, 页码: 771-775
Authors:  Pang XJ(逄显娟);  Shi L(石雷);  Wang P(王鹏);  Xia YQ(夏延秋);  Liu WM(刘维民)
Adobe PDF(912Kb)  |  Favorite  |  View/Download：336/5  |  Submit date：2012/09/24
Magnetron Sputtering  Tial-doped A-c:h FIlms  Ti-doped A-c:h FIlms  Microstructure  Tribological Properties