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Erosion Mechanism of MoS2-Based Films Exposed to Atomic Oxygen Environments 期刊论文
ACS Applied Materials and Interfaces, 2015, 卷号: 7, 期号: 23, 页码: 12943-12950
Authors:  Wang P(王鹏);  Qiao L(乔丽);  Xu J(许佼);  Li WX(李无暇);  Liu WM(刘维民);  Wang P(王鹏)
Adobe PDF(8793Kb)  |  Favorite  |  View/Download：173/7  |  Submit date：2015/10/26
Atomic Oxygen  Exposure  Mos2 Films  Erosion Mechanism  Titanium Doping Multilayer