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中国科学院兰州化学物理研究所机构知识库
KMS Lanzhou Institute of Chemical Physics，Chinese Academy of Sciences
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固体润滑国家重点实验... [1]
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Source Publication：Applied Surface Science
Date Issued：2011
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A magnetron sputtering technique to prepare a-C:H films: Effect of substrate bias
期刊论文
Applied Surface Science, 2011, 卷号: 257, 页码: 1990-1995
Authors:
Wang YX(王永霞)
;
Ye YP(冶银平)
;
Li HX(李红轩)
;
Ji L(吉利)
;
Chen JM(陈建敏)
;
Zhou HD(周惠娣)
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Submit date：2012/09/24
A-c:h FIlm
Magnetron Sputtering
Substrate Bias
Microstructure
Tribological Property
