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Influence of the incident flux angles on the structures and properties of magnetron sputtered MoS2 films 期刊论文
Journal of Physics D: Applied Physics, 2015, 卷号: 48, 期号: 17, 页码: 175304(1-8)
Authors:  Qiao L(乔丽);  Wang P(王鹏);  Chai LQ(柴利强);  Zhang XL(张小龙);  Liu WM(刘维民);  Wang P(王鹏)
Adobe PDF(1940Kb)  |  Favorite  |  View/Download:144/4  |  Submit date:2015/10/28
Mos2 Films  Oblique Angle Deposition  Surface Tribology  Magnetron Sputtering