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Influence of the incident flux angles on the structures and properties of magnetron sputtered MoS2 films
Department固体润滑国家重点实验室
Qiao L(乔丽); Wang P(王鹏); Chai LQ(柴利强); Zhang XL(张小龙); Liu WM(刘维民); Wang P(王鹏)
2015
Source PublicationJournal of Physics D: Applied Physics
ISSN0022-3727
Volume48Issue:17Pages:175304(1-8)
AbstractIn this study, by adjusting the angle between the incident flux and the normal direction of the substrate's surface, the MoS2 film prepared by magnetron sputtering was used as a model system to study the influence of incident flux angles on the structures and properties of deposited films. The morphological and structural evolutions of MoS2 films deposited at different angles ranging from 0 to 85 degrees were characterized and the corresponding mechanical and tribological properties were evaluated. The results show that a conversion of a continuous film structure to a separate columnar structure with high porosity is found as the incident flux angle increases. Although changing the incident flux angle plays a negligible effect on the crystal preferential orientation of deposited MoS2 films, the mechanical and tribological properties of these films degrade dramatically when the incident flux angle is larger than 60 degrees.
KeywordMos2 Films Oblique Angle Deposition Surface Tribology Magnetron Sputtering
Subject Area材料科学与物理化学
DOI10.1088/0022-3727/48/17/175304
Funding Organizationthe National Natural Science Foundation of China (Grant No: 51227804;11475236)
Indexed BySCI
If2.772
Language英语
Funding Project辐照环境下润滑与防护材料研究
compositor第一作者单位
Citation statistics
Cited Times:10[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/18423
Collection固体润滑国家重点实验室(LSL)
Corresponding AuthorWang P(王鹏)
AffiliationChinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
Recommended Citation
GB/T 7714
Qiao L,Wang P,Chai LQ,et al. Influence of the incident flux angles on the structures and properties of magnetron sputtered MoS2 films[J]. Journal of Physics D: Applied Physics,2015,48(17):175304(1-8).
APA Qiao L,Wang P,Chai LQ,Zhang XL,Liu WM,&王鹏.(2015).Influence of the incident flux angles on the structures and properties of magnetron sputtered MoS2 films.Journal of Physics D: Applied Physics,48(17),175304(1-8).
MLA Qiao L,et al."Influence of the incident flux angles on the structures and properties of magnetron sputtered MoS2 films".Journal of Physics D: Applied Physics 48.17(2015):175304(1-8).
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