Influence of the incident flux angles on the structures and properties of magnetron sputtered MoS2 films | |
Department | 固体润滑国家重点实验室 |
Qiao L(乔丽); Wang P(王鹏); Chai LQ(柴利强); Zhang XL(张小龙); Liu WM(刘维民); Wang P(王鹏) | |
2015 | |
Source Publication | Journal of Physics D: Applied Physics |
ISSN | 0022-3727 |
Volume | 48Issue:17Pages:175304(1-8) |
Abstract | In this study, by adjusting the angle between the incident flux and the normal direction of the substrate's surface, the MoS2 film prepared by magnetron sputtering was used as a model system to study the influence of incident flux angles on the structures and properties of deposited films. The morphological and structural evolutions of MoS2 films deposited at different angles ranging from 0 to 85 degrees were characterized and the corresponding mechanical and tribological properties were evaluated. The results show that a conversion of a continuous film structure to a separate columnar structure with high porosity is found as the incident flux angle increases. Although changing the incident flux angle plays a negligible effect on the crystal preferential orientation of deposited MoS2 films, the mechanical and tribological properties of these films degrade dramatically when the incident flux angle is larger than 60 degrees. |
Keyword | Mos2 Films Oblique Angle Deposition Surface Tribology Magnetron Sputtering |
Subject Area | 材料科学与物理化学 |
DOI | 10.1088/0022-3727/48/17/175304 |
Funding Organization | the National Natural Science Foundation of China (Grant No: 51227804;11475236) |
Indexed By | SCI |
If | 2.772 |
Language | 英语 |
Funding Project | 辐照环境下润滑与防护材料研究 |
compositor | 第一作者单位 |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.licp.cn/handle/362003/18423 |
Collection | 固体润滑国家重点实验室(LSL) |
Corresponding Author | Wang P(王鹏) |
Affiliation | Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China |
Recommended Citation GB/T 7714 | Qiao L,Wang P,Chai LQ,et al. Influence of the incident flux angles on the structures and properties of magnetron sputtered MoS2 films[J]. Journal of Physics D: Applied Physics,2015,48(17):175304(1-8). |
APA | Qiao L,Wang P,Chai LQ,Zhang XL,Liu WM,&王鹏.(2015).Influence of the incident flux angles on the structures and properties of magnetron sputtered MoS2 films.Journal of Physics D: Applied Physics,48(17),175304(1-8). |
MLA | Qiao L,et al."Influence of the incident flux angles on the structures and properties of magnetron sputtered MoS2 films".Journal of Physics D: Applied Physics 48.17(2015):175304(1-8). |
Files in This Item: | ||||||
File Name/Size | DocType | Version | Access | License | ||
Influence of the inc(1940KB) | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text |
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment