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Effects of pulse bias duty cycle on fullerenelike nanostructure and mechanical properties of hydrogenated carbon films prepared by plasma enhanced chemical vapor deposition method 期刊论文
Journal of Applied Phyics, 2009, 卷号: 105, 页码: 106113(1-3)
Authors:  Ji L(吉利);  Li HX(李红轩);  Zhao F(赵飞);  Quan WL(权伟龙);  Chen JM(陈建敏);  Zhou HD(周惠娣)
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