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Effects of pulse bias duty cycle on fullerenelike nanostructure and mechanical properties of hydrogenated carbon films prepared by plasma enhanced chemical vapor deposition method
Department固体润滑国家重点实验室 ; 先进润滑与防护材料研究发展中心
Ji L(吉利); Li HX(李红轩); Zhao F(赵飞); Quan WL(权伟龙); Chen JM(陈建敏); Zhou HD(周惠娣)
2009
Source PublicationJournal of Applied Phyics
ISSN0021-8979
Volume105Pages:106113(1-3)
AbstractFullerenelike hydrogenated carbon films were produced by pulse bias-assisted rf inductively coupled plasma enhanced chemical vapor deposition ICPECVD . The effects of pulse duty cycle on the microstructure and mechanical properties of the resultant films were investigated by means of high resolution transmission electron microscopy HRTEM , Raman spectroscopy, nanoindentation, and stress measurement. The low pulse duty cycle was found the key in the formation of fullerenelike structure in hydrogenated carbon films, and thus increased the hardness, elasticity, and internal stress of the films. The role of pulse duty cycle in evolution of fullerenelike structure was also discussed in terms of ion bombardment, hydrogen removal, and “annealing” effects.
Subject Area材料科学与物理化学
Funding Organizationthe National Natural Science Foundation of China (NSFC) (Nos. 50705093;50575217);the Innovative Group Fund from NSFC (No. 50421502);“973” Plan (No. 2007CB607601);the Fundamental Scientific Research of China (No. A1320060604)
Indexed BySCI
Language英语
Funding Project磨损与表面工程组
Citation statistics
Cited Times:25[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/2047
Collection固体润滑国家重点实验室(LSL)
中国科学院材料磨损与防护重点实验室/先进润滑与防护材料研究发展中心
Corresponding AuthorChen JM(陈建敏)
Recommended Citation
GB/T 7714
Ji L,Li HX,Zhao F,et al. Effects of pulse bias duty cycle on fullerenelike nanostructure and mechanical properties of hydrogenated carbon films prepared by plasma enhanced chemical vapor deposition method[J]. Journal of Applied Phyics,2009,105:106113(1-3).
APA 吉利,李红轩,赵飞,权伟龙,陈建敏,&周惠娣.(2009).Effects of pulse bias duty cycle on fullerenelike nanostructure and mechanical properties of hydrogenated carbon films prepared by plasma enhanced chemical vapor deposition method.Journal of Applied Phyics,105,106113(1-3).
MLA 吉利,et al."Effects of pulse bias duty cycle on fullerenelike nanostructure and mechanical properties of hydrogenated carbon films prepared by plasma enhanced chemical vapor deposition method".Journal of Applied Phyics 105(2009):106113(1-3).
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