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Morphology and thermal stability of Ti-doped copper nitride films 期刊论文
JOURNAL OF PHYSICS D: APPLIED PHYSICS, 2007, 卷号: 40, 页码: 3430-3435
Authors:  Fan XY(范晓彦);  Wu ZG(吴志国);  Li HJ(李华军);  Geng BS(耿柏松);  Li C(李春);  Yan PX(阎鹏勋)
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