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Characterization and temperature controlling property of TiAlN coatings deposited by reactive magnetron co-sputtering 期刊论文
Journal of Alloys and Compounds, 2009, 卷号: 472, 页码: 91-96
Authors:  Chen JT(陈江涛);  Wang J(王君);  Zhang F(张飞);  Zhang GA(张广安);  Fan XY(范晓彦);  Wu ZG(吴志国);  Yan PX(阎鹏勋)
Adobe PDF(1485Kb)  |  Favorite  |  View/Download：183/2  |  Submit date：2012/12/04
Tialn Coatings  Magnetron Sputtering  Xrd  Thermal Controlling  
The effect of hydrogen on copper nitride thin films deposited by magnetron sputtering 期刊论文
Applied Surface Science, 2008, 卷号: 254, 页码: 5012-5015
Authors:  Zhang GA(张广安);  Yan PX(阎鹏勋);  Wu ZG(吴志国);  Wang J(王君);  Chen JT(陈江涛)
Adobe PDF(574Kb)  |  Favorite  |  View/Download：79/0  |  Submit date：2013/03/28
Copper Nitride  Thin FIlms  Hydrogen  Structure  Thermal Properties