The effect of hydrogen on copper nitride thin films deposited by magnetron sputtering | |
Department | 固体润滑国家重点实验室 |
Zhang GA(张广安); Yan PX(阎鹏勋); Wu ZG(吴志国); Wang J(王君); Chen JT(陈江涛) | |
2008 | |
Source Publication | Applied Surface Science |
ISSN | 0169-4332 |
Volume | 254Pages:5012-5015 |
Abstract | Copper nitride thin films were deposited on Si (1 0 0) wafers by reactive magnetron sputtering at various H2/N2 ratios. X-ray diffraction measurements show that the films are composed of Cu3N crystallites with anti-ReO3 structure and exhibit preferred orientation of [1 0 0] direction. Although the relative composition of the films has obviously changes with the H2/N2 ratios, the orientations of the films keep almost no changes. However, the grain size, lattice parameter and composition of the films are strongly dependent on the H2/N2 ratios. The copper nitride films prepared at 10% H2/N2 ratios show poor stability and large weight gain compared to the copper nitride films prepared at 0% H2/N2 ratios. |
Keyword | Copper Nitride Thin FIlms Hydrogen Structure Thermal Properties |
Subject Area | 材料科学与物理化学 |
Funding Organization | Natural Science Foundation of China (Granted No 50772115) |
Indexed By | SCI |
Language | 英语 |
Funding Project | 低维材料摩擦学组 |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.licp.cn/handle/362003/2583 |
Collection | 固体润滑国家重点实验室(LSL) |
Corresponding Author | Yan PX(阎鹏勋) |
Recommended Citation GB/T 7714 | Zhang GA,Yan PX,Wu ZG,et al. The effect of hydrogen on copper nitride thin films deposited by magnetron sputtering[J]. Applied Surface Science,2008,254:5012-5015. |
APA | 张广安,阎鹏勋,吴志国,王君,&陈江涛.(2008).The effect of hydrogen on copper nitride thin films deposited by magnetron sputtering.Applied Surface Science,254,5012-5015. |
MLA | 张广安,et al."The effect of hydrogen on copper nitride thin films deposited by magnetron sputtering".Applied Surface Science 254(2008):5012-5015. |
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