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The effect of hydrogen on copper nitride thin films deposited by magnetron sputtering
Department固体润滑国家重点实验室
Zhang GA(张广安); Yan PX(阎鹏勋); Wu ZG(吴志国); Wang J(王君); Chen JT(陈江涛)
2008
Source PublicationApplied Surface Science
ISSN0169-4332
Volume254Pages:5012-5015
AbstractCopper nitride thin films were deposited on Si (1 0 0) wafers by reactive magnetron sputtering at various H2/N2 ratios. X-ray diffraction measurements show that the films are composed of Cu3N crystallites with anti-ReO3 structure and exhibit preferred orientation of [1 0 0] direction. Although the relative composition of the films has obviously changes with the H2/N2 ratios, the orientations of the films keep almost no changes. However, the grain size, lattice parameter and composition of the films are strongly dependent on the H2/N2 ratios. The copper nitride films prepared at 10% H2/N2 ratios show poor stability and large weight gain compared to the copper nitride films prepared at 0% H2/N2 ratios.
KeywordCopper Nitride Thin FIlms Hydrogen Structure Thermal Properties
Subject Area材料科学与物理化学
Funding OrganizationNatural Science Foundation of China (Granted No 50772115)
Indexed BySCI
Language英语
Funding Project低维材料摩擦学组
Citation statistics
Cited Times:14[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.licp.cn/handle/362003/2583
Collection固体润滑国家重点实验室(LSL)
Corresponding AuthorYan PX(阎鹏勋)
Recommended Citation
GB/T 7714
Zhang GA,Yan PX,Wu ZG,et al. The effect of hydrogen on copper nitride thin films deposited by magnetron sputtering[J]. Applied Surface Science,2008,254:5012-5015.
APA 张广安,阎鹏勋,吴志国,王君,&陈江涛.(2008).The effect of hydrogen on copper nitride thin films deposited by magnetron sputtering.Applied Surface Science,254,5012-5015.
MLA 张广安,et al."The effect of hydrogen on copper nitride thin films deposited by magnetron sputtering".Applied Surface Science 254(2008):5012-5015.
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